Bearing roller unbalanced magnetron sputtering ion plating device and bearing roller unbalanced magnetron sputtering ion plating method

Abstract

The invention relates to the field of manufacturing of bearing rollers and aims to provide a bearing roller unbalanced magnetron sputtering ion plating device and a bearing roller unbalanced magnetron sputtering ion plating method. The bearing roller unbalanced magnetron sputtering ion plating device includes a vacuum chamber, a workpiece supporting rotary bench inside the vacuum chamber, a plurality pairs of chromium targets and a plurality pairs of carbon targets which are same in the number of pairs and are alternately arranged on the periphery of the workpiece supporting rotary bench, a bias power supply, a heater, a vacuum apparatus communicated with the vacuum chamber, an operating gas bottle and a heater. The bearing roller unbalanced magnetron sputtering ion plating device is less in friction coefficient and wear rate and is high in vibration precision and abrasive resistance when a roller rotates in a high speed, so that performance stability of a bear is improved. The bearing roller unbalanced magnetron sputtering ion plating method allows a roller being subjected to the magnetron sputtering to satisfy a less friction coefficient and a less wear rate and a high vibration precision and a high wear resistance during high-speed rotation, thereby improving the performance stability of the bear.

Description

technical field [0001] The invention relates to the field of manufacturing bearing rollers, in particular to an unbalanced magnetron sputtering ion plating device and method for bearing rollers. Background technique [0002] Bearings are widely used load supports and moving joints. They are often used in harsh working conditions such as high rotation speed, long fatigue life and high operating stability. Their performance reliability directly affects the performance of the main engine; The reasons are more complex, such as materials, structural parameters, parts manufacturing accuracy, lubrication conditions, installation accuracy, etc. will all affect performance reliability; rollers (rotating bodies) processed by traditional methods have friction coefficients and wear rates when rotating at high speeds Larger, poor vibration accuracy and wear resistance, which affect performance reliability, reduce the friction coefficient and wear rate when the roller rotates at high spee...

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Problems solved by technology

[0003] The purpose of the present invention is to overcome the shortcomings of the roller (rotating body) processed by the traditional method at present, which have a large friction coefficient and wear rate when rotating at high speed, poor vibration accuracy and wear resistance, which affect performance reliability, and provide An unbalanced magnetron sputtering ion plating device and method for a bearing roller with low friction coefficient and wear rate when the roller rotates at high speed, high vibration accuracy and wear resistance, thereby improving the performance stability of the bearing

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