A high color stability white light organic electroluminescent device
An electroluminescent device, color stability technology, applied in the direction of electric solid-state devices, electrical components, semiconductor devices, etc., can solve the problems of poor color stability, low efficiency, complex structure, etc., to improve color quality, improve stability, The effect of improving device efficiency
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Embodiment 1
[0042] Fabrication of high color stability white organic electroluminescence device W1 with the following device structure: ITO / MoO 3 (3nm) / CBP (30nm) / CBP: 8wt% Ir(piq) 2 acac (10nm) / CBP: 6wt% Ir(4m3CF4Fpq) 2 (acac)(4.5nm) / CBP: 6wt% Ir(ppy) 3 (2.5nm) / CBP: 20wt% Firpic (8nm) / TPBi: 20wt% Firpic (8nm) / TPBi: 6wt% Ir(ppy) 3 (2.5nm) / TPBi: 6wt% Ir(4m3CF4Fpq) 2 (acac)(4.5nm) / TPBi: 8wt% Ir(piq) 2 acac (10nm) / TPBi (30nm) / LiF (1nm) / Al (200nm).
[0043] The structure of W1 is as follows figure 1 , is composed of transparent conductive thin film anode 2, hole injection layer 3, hole transport layer 4, light emitting layer I5, light emitting layer II6, electron transport layer 7, electron injection layer 8 and cathode deposited on the transparent glass substrate 1 in sequence 9, and an external circuit 10 is connected between the anode 2 and the cathode 9. It is characterized by a pair of symmetrical light-emitting layers, the light-emitting layer I and the li...
Embodiment 2
[0058] The white light device W2 was prepared by changing the film thickness ratios of different color light-emitting layers in Example 1.
[0059] The structure of device W2 is: ITO / MoO 3 (3nm) / CBP (30nm) / CBP: 8wt% Ir(piq) 2 acac(13nm) / CBP: 6wt% Ir(4m3CF4Fpq) 2 (acac) (4nm) / CBP: 6wt% Ir(ppy) 3 (2nm) / CBP: 20wt% Firpic (6nm) / TPBi: 20wt% Firpic (6nm) / TPBi: 6wt% Ir(ppy) 3 (2nm) / TPBi: 6wt% Ir(4m3CF4Fpq) 2(acac) (4nm) / TPBi: 8wt% Ir(piq) 2 acac (13nm) / TPBi (30nm) / LiF (1nm) / Al (200nm).
[0060] The difference from device W1 is that in the light-emitting layer of device W2 in this embodiment, different color light-emitting materials are doped in light-emitting layer I and light-emitting layer II. 2 acac (10nm), Ir(4m3CF4Fpq) 2 (acac)(4.5nm), Ir(ppy) 3 (2.5nm) and Firpic (8nm) are changed to 13nm, 4nm, 2nm and 6nm in device W2, and the detailed preparation, packaging and testing process of the device are exactly the same as W1 in Example 1.
[0061] Th...
Embodiment 3
[0063] A three-band symmetrical light-emitting layer white light device W3 was prepared, and its light-emitting layer is different from the four-band symmetrical light-emitting layer device W1 in Example 1. The specific device structure is: ITO / MoO 3 (3nm) / CBP (30nm) / CBP: 8wt% Ir(piq) 2 acac (12nm) / CBP: 6wt% Ir(ppy) 3 (5nm) / CBP: 20wt% Firpic (8nm) / TPBi: 20wt% Firpic (8nm) / TPBi: 6wt% Ir(ppy) 3 (5nm) / TPBi: 8wt% Ir(piq) 2 acac (12nm) / TPBi (30nm) / LiF (1nm) / Al (200nm).
[0064] In this embodiment, the structure of the device is similar to that of the device W1 in Embodiment 1, except that the light emitting layer is different. The emitting layer of device W3 is as Figure 8 shown, from Figure 8 It can be seen that the luminescent layer of W3 also takes the exciton generation interface as the symmetry axis, and the luminescent layers on both sides are symmetrically distributed. What is different from W1 is that the luminescent layer of the device is com...
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