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Alkali developable photosensitive composition

A technology of photosensitive composition and alkali developability, applied in optics, photography, optical elements, etc., can solve the problem of unsatisfactory light fastness of photosensitive composition, achieve excellent light fastness, high alkali resistance, light excellent engraving effect

Active Publication Date: 2015-03-04
ADEKA CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] However, the photosensitive compositions described in these documents are not satisfactory in terms of light resistance.

Method used

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  • Alkali developable photosensitive composition
  • Alkali developable photosensitive composition
  • Alkali developable photosensitive composition

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0105] [Example 1] Preparation of Alkali Developable Photosensitive Composition No.1

[0106] 0.16 g of bis(trifluoromethanesulfonyl)imide salts of Compound No. 1-1 as (A) component and 3.70 g of dimethylacetamide as a part of (D) component were added, stirred and dissolved. Then, 4.95 g of ACA Z250 (manufactured by DAICEL-CYTEC Co., Ltd.) and 1.96 g of Aronix M-450 (manufactured by Toagosei Co., Ltd.) as the component (B) and 0.07 g of OXE-01 (manufactured by BASF Co., Ltd.) as the component (C) were added , 2.92 g of PGMEA as a part of (D) component, and 0.001 g of FZ2122 (made by Toray Dow Corning) as other components were mixed, stirred until insoluble matter disappeared, and alkali-developable photosensitive composition No. 1 was obtained.

Embodiment 2～13 and comparative example 1～3

[0107] [Examples 2-13 and Comparative Examples 1-3] Preparation of alkali-developable photosensitive compositions No.2-No.13 and comparative alkali-developable photosensitive compositions No.1-No.3

[0108] Following the same procedure as in Example 1, the ingredients were mixed with the formulation shown in Table 1 to obtain alkali-developable photosensitive compositions No.2 to No.13 and comparative alkali-developable photosensitive compositions No.1 to No. .3.

[0109] Table 1

[0110]

[0111] *1: V259Me: Nippon Steel Chemical Co., Ltd.

[0112] *2: JET2000: Made by Osaka Organic Chemical Industry Co., Ltd.

[0113] *3: SPC-1000: Manufactured by Showa Denko

[0114] *4: SPC-3000: Manufactured by Showa Denko

[0115] *5: WR-301: Made by ADEKA Corporation

[0116] *6: OXE-02: Made by BASF Corporation

[0117] *7: NCI-930: Made by ADEKA Corporation

[0118] *8: NCI-831: Made by ADEKA Corporation

[0119] *9: N-1919: Made by ADEKA Corporation

[0120] *10: Irg-907:...

Embodiment 14～26 and comparative example 4～6

[0127] [Examples 14 to 26 and Comparative Examples 4 to 6] Production of near-infrared absorption filters No.1 to No.13 and comparative near-infrared absorption filters No.1 to No.3

[0128] 2.5 mL of alkali-developable photosensitive compositions No.1 to No.13 and comparative alkali-developable photosensitive compositions No.1 to No. obtained in Examples 1 to 13 and Comparative Examples 1 to 3 were dropped on a glass substrate .3, Spin coating at 250rpm×10 seconds, then dry at 90°C for 100 seconds, and use a high-pressure mercury lamp to perform 300mJ / cm 2 After exposure, near-infrared absorption filters No. 1 to No. 13 and comparison near-infrared absorption filters No. 1 to No. 3 were produced.

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PUM

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Abstract

This alkali developable photosensitive composition contains an infrared absorbing dye (A), a polymerizable compound (B) having an ethylenically unsaturated bond and an alkali-soluble substituent group that imparts alkali developability, a photopolymerization initiator (C) and a solvent (D), wherein the photopolymerization initiator (C) contains an oxime ester compound. The aforementioned photopolymerization initiator (C) preferably contains a compound represented by general formula (I). (Refer to the description for definitions of R1, R2, R3, R4, X, a and b in the formula.)

Description

technical field [0001] The present invention relates to an alkali-developable photosensitive composition containing an infrared-absorbing dye, and a near-infrared-absorbing filter using the alkali-developable photosensitive composition. Background technique [0002] Photosensitive compositions containing infrared absorbing pigments are used in various applications. [0003] Patent Document 1 discloses a color filter using a photosensitive coloring composition cured by irradiation with near-infrared light, and Patent Document 2 discloses a filter for a plasma display panel capable of shielding wavelengths in the near-infrared region. Patent Document 2 3 discloses an infrared-sensitive lithographic printing plate using a particulate matting agent containing an alkali-soluble resin and an infrared-absorbing dye, and Patent Document 4 discloses a near-infrared absorption filter using a curable composition containing a near-infrared absorbing dye. device. [0004] However, the ...

Claims

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Application Information

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IPC IPC(8): G03F7/031G02B5/22G03F7/004
CPCG03F7/031
Inventor 前田洋介清水正晶
Owner ADEKA CORP