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Color filter and manufacturing method thereof

A color filter, a technology for manufacturing method, applied in the direction of filter, optics, nonlinear optics, etc., can solve the problem of thick protective layer, the protective layer of color filter is not flat enough, reducing the transmittance of liquid crystal display panel, etc. problem, to achieve the effect of reducing the angle difference and improving the display effect

Inactive Publication Date: 2015-03-25
SHENZHEN CHINA STAR OPTOELECTRONICS TECH CO LTD
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  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0006] The purpose of the present invention is to provide a color filter and its manufacturing method, to solve the technical problem that the protective layer of the color filter in the prior art is not flat enough or the protective layer is relatively thick, and reduce the transmittance of the liquid crystal display panel

Method used

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  • Color filter and manufacturing method thereof
  • Color filter and manufacturing method thereof
  • Color filter and manufacturing method thereof

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Embodiment Construction

[0038] The following descriptions of the various embodiments refer to the accompanying drawings to illustrate specific embodiments in which the present invention can be practiced. The directional terms mentioned in the present invention, such as "up", "down", "front", "back", "left", "right", "inside", "outside", "side", etc., are for reference only The orientation of the attached schema. Therefore, the directional terms used are used to illustrate and understand the present invention, but not to limit the present invention. In the figures, structurally similar units are denoted by the same reference numerals.

[0039] Please refer to Figure 3-6 , a schematic diagram of the manufacturing process of the color filter according to the first embodiment of the present invention is given.

[0040] The manufacture method of color filter of the present invention is as Figure 3-6 shown, which includes:

[0041] S101, coating a black matrix material on the base substrate;

[004...

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Abstract

The invention provides a color filter and a manufacturing method of the color filter. The method comprises the steps that a substrate is coated with a black matrix material; exposure is performed on the black matrix material by using a halftone mask plate; development is performed on the exposed black matrix material so that a plurality of black matrixes can be formed, wherein the black matrixes comprise first parts and second parts, and the height of the first parts is larger than that of the second parts; a plurality of color film color resistors are formed between every two adjacent black matrixes and on the second parts so that the angle section differences of the color film color resistors can be reduced. According to the color filter and the manufacturing method of the color filter, by decreasing the height of the parts, overlapped with the color film color resistors, of the black matrixes, the angle section differences of the color film color resistors are lowered, and therefore the display effect of an LCD panel is improved.

Description

【Technical field】 [0001] The invention relates to the technical field of liquid crystal displays, in particular to a color filter and a manufacturing method thereof. 【Background technique】 [0002] At present, when the color filter is produced, in order to avoid light leakage at the edge of the color filter color filter, a black matrix is ​​set between the color filter color filter. Such as figure 1 As mentioned above, usually the black matrix 104 is first fabricated on the base substrate 10, and then the color filter color resists 101-103 (respectively representing the red color filter, the green color filter, and the blue color filter) are fabricated. There is a certain overlap between the color filter color resistance and the black matrix. In the overlapping area, the color filter color resistance will have a certain protrusion, which will cause the angular segment difference L0 of the color filter color resistance. [0003] Especially when the line width of the black ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G02B5/20G02F1/1335G02F1/1333
CPCG02F1/133514G02F1/133512G02F1/133516
Inventor 康启明
Owner SHENZHEN CHINA STAR OPTOELECTRONICS TECH CO LTD
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