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Pixel array and manufacturing method, and display device

A technology of a pixel array and a manufacturing method, which is applied in the display field, can solve the problems of the breakage of the ITO transparent electrode, affecting the display stability of an electrowetting display device, reducing the size of the storage capacitor in the pixel area, etc., so as to achieve the pixel aperture ratio and enhance the storage Capacitance, the effect of achieving stability

Active Publication Date: 2017-05-31
NANJING CEC PANDA LCD TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] In the pixel array produced by the existing manufacturing process, in the pixel opening area, it is easy to cause a reverse chamfer between the contact hole area formed by the protective layer and the second metal layer below, causing the ITO transparent electrode to break at the reverse chamfer. The voltage of the pixel electrode cannot be normally transmitted to the ITO transparent electrode, which will reduce the storage capacitance of the pixel area and affect the stability of the electrowetting display device.

Method used

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  • Pixel array and manufacturing method, and display device
  • Pixel array and manufacturing method, and display device
  • Pixel array and manufacturing method, and display device

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Embodiment 1

[0036] Figure 3A It is a schematic diagram showing a photolithography process in a method for fabricating a pixel array according to an embodiment of the present invention; Figure 3B It is a schematic diagram showing the secondary photolithography process in the method for manufacturing the pixel array in the above-mentioned embodiment of the present invention. Such as Figure 3A , 3B As shown, Embodiment 1 of the present invention proposes a method for manufacturing a pixel array, which specifically includes the following steps: providing a substrate 50, on which are sequentially formed: a first metal layer, a gate insulating layer and a semiconductor layer 53, a second The metal layer 55, wherein the second metal layer 55 is exposed twice and etched twice to form a first area A of the data line and a second area B of the first pixel electrode. Specifically, the manufacturing method uses physical vapor deposition PVD technology to continuously form Ti metal and Al metal ...

Embodiment 2

[0040] Figure 4 It is a schematic diagram of a photolithography process in a method for manufacturing a pixel array according to another embodiment of the present invention. Such as Figure 4 As shown, Embodiment 2 of the present invention proposes a method for manufacturing a pixel array, which specifically includes the following steps: providing a substrate 50, on which are sequentially formed: a first metal layer, a gate insulating layer and a semiconductor layer 53, a second The metal layer 55, wherein, the second metal layer 55 is etched twice through one exposure to form the first area A of the data line and the second area B of the first pixel electrode.

[0041] Specifically, the manufacturing method uses physical vapor deposition PVD technology to continuously form Ti metal and Al metal films to form the second metal layer. Then, the second metal layer on the data line in the first region A forms a Ti / Al structure by using the grayscale third mask 20 once for expos...

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Abstract

The invention discloses a pixel array, a manufacturing method of the pixel array and a display device. The pixel array comprises a substrate, a first metal layer, a gate insulation layer, a semiconductor layer and a second metal layer, wherein the first metal layer, the gate insulation layer, the semiconductor layer and the second metal layer are sequentially formed on the substrate; a first region of data lines and a second region of a first pixel electrode are formed on the second metal layer; the first region includes at least two metal alloy layers, and the second region includes a single metal layer. The manufacturing method of the pixel array comprises the steps that two binary mask plates or a ternary mask plate is adopted, and the purposes that the first region of the second metal layer is of a metal alloy laminated structure and the second region is of a single-layer metal structure are achieved respectively. By the adoption of the pixel array, the manufacturing method of the pixel array and the display device, the pixel aperture ratio is maximized, storage capacitance can also be enhanced, and the stability of electrowetting display is achieved.

Description

technical field [0001] The present invention relates to the field of display technology, in particular to a pixel array, a manufacturing method, and a display device. Background technique [0002] Electrowetting (Electrowetting) display technology utilizes the natural forces inherent in the oil-water interface and the display technologies developed to exploit these forces. Specifically, the hydration of the hydrophobic surface of hydrophobic pigments such as dyed oil droplets is adjusted by applying a voltage, so that the dyed oil droplets spread evenly in the pixel when no voltage is applied, and are quickly pushed to the edge of the pixel after the voltage is applied, thereby realizing the color gray color. step display. [0003] As a reflective display technology, the light reflection efficiency of the electrowetting display exceeds 50%, so the brightness is twice as high as that of the general passive display device, and it can still be viewed under strong sunlight. At...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G02B26/00
Inventor 时陶洪孟锋
Owner NANJING CEC PANDA LCD TECH