Synchronous measurement structure and method for contact resistance and contact force of MEMS materials

A contact resistance and synchronous measurement technology, applied in the field of measurement structure, can solve the problems of high measurement cost, poor versatility, and bulky volume, and achieve the effect of small size, simple structure and strong versatility

Inactive Publication Date: 2015-04-29
可优微环保新能源(南京)有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0004] In the prior art, the special test equipment used for contact resistance measurement is expensive, bulky, an...

Method used

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  • Synchronous measurement structure and method for contact resistance and contact force of MEMS materials
  • Synchronous measurement structure and method for contact resistance and contact force of MEMS materials
  • Synchronous measurement structure and method for contact resistance and contact force of MEMS materials

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Embodiment Construction

[0035] Below in conjunction with accompanying drawing of description, the present invention will be further described.

[0036] like figure 1 , figure 2 , image 3 and Figure 4 As shown, a synchronous measurement structure for contact resistance and contact force of MEMS materials, including an insulating substrate 1, a V-shaped thermal actuator 2 and a return spring 3 that are located on the horizontal upper end of the insulating substrate 1 at the same horizontal central axis. , movable contact electrode 4 and fixed contact electrode 5; also comprise the scale structure 6 that is arranged in the return word spring 3 and be used for reading test scale; Test spacing 10.

[0037] The V-shaped thermal actuator 2, the return spring 3 and the movable contact electrode 4 are sequentially connected into one body, and are maintained in a suspended state by support; the fixed contact electrode 5 is also maintained in a suspended state by support; the V-shaped thermal actuator T...

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Abstract

The invention discloses a synchronous measurement structure and method for contact resistance and contact force of MEMS (Micro Electro Mechanical Systems) materials, wherein the synchronous measurement structure comprises an insulating substrate, a V-type thermal actuator which is suspended on the upper end surface of the insulating substrate and is made of a conductive material through surface micromachining, a return spring, a movable contact electrode and a fixed contact electrode, as well as a scale structure for reading test scales; the movable contact electrode and the fixed contact electrode are test distance of initial state apart; the V-type thermal actuator, the return spring and the movable contact electrode move close to the fixed contact electrode together by applying current heating expansion, so that opposite sides of the movable contact electrode and the fixed contact electrode are in contact to generate contact force and are used for the synchronous measurement of the contact resistance and the contact force of conductive materials. With the adoption of electrothermal driving mode, the invention is simple and easy to operate, convenient to operate, fast to measure, and further convenient for online testing and high-precision testing; and based on the MEMS processing technology, the invention can reduce the production cost, and is featured with simple structure, small size and strong universality.

Description

technical field [0001] The present invention relates to a measurement structure and method, in particular to a synchronous measurement structure and measurement method for contact resistance and contact force of MEMS materials manufactured by MEMS surface micromachining technology, belonging to the manufacture of micro-electromechanical systems and their performance reliability Test technology field. Background technique [0002] At present, the research on contact characteristics has received more and more attention, which is directly related to the performance and reliability of MEMS devices with contact structures. [0003] Taking the MEMS switch as an example, the contact electrodes contact each other under electrostatic excitation or thermal excitation to form a conduction circuit, and the contact resistance plays the role of the main resistance in this circuit. The size of the contact resistance changes with the change of the contact force, and the size of the contact...

Claims

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Application Information

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IPC IPC(8): G01D21/02G01R27/16G01L5/00B81B7/00
Inventor 刘海韵
Owner 可优微环保新能源(南京)有限公司
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