Chemical filter element cleaning device and chemical filter element cleaning method
A chemical cleaning and filter element technology, which is applied in chemical instruments and methods, separation methods, filtration separation, etc., can solve the problems of increased replacement frequency, shortened life of safety filter elements, and increased investment in anionic polymers, so as to avoid cost increase and reduce cost Effect
Inactive Publication Date: 2015-05-13
SHANGHAI HUAHONG GRACE SEMICON MFG CORP
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Problems solved by technology
After a comprehensive inspection of the ultrapure water pretreatment system equipment operating parameters are within the normal range, the reason for the final investigation is that the water quality change in the new water source caused the water plant to change the treatment process, adding anionic polymer to the original treatment and purification process. The link of investment will eventually directly lead to the greatly shortened life of the end user's safety filter element, the increase in replacement frequency, and the greatly increased replacement cost of safety filter consumables, up to 5.6 times the original
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[0029] The chemical cleaning device and cleaning method of the filter element of the present invention will be described in more detail below with reference to the schematic diagrams, wherein the preferred embodiments of the present invention are shown. It should be understood that those skilled in the art can modify the present invention described herein and still realize the present invention. beneficial effect. Therefore, the following description should be construed as widely known to those skilled in the art and not as a limitation of the present invention.
[0030] In the interest of clarity, not all features of an actual embodiment are described. In the following description, well-known functions or constructions are not described in detail since they would obscure the invention with unnecessary detail. It should be recognized that in the development of any actual embodiment, a number of implementation details must be made to achieve the developer's specific goals, suc...
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The invention provides a chemical filter element cleaning device and a chemical filter element cleaning method. The method comprises the following steps: putting a filter element to be cleaned and recycled into a soaking tank, soaking the filter element by using chemicals, and removing the attached high polymer organic matters inside the filter element to be cleaned and recycled, so that the filter element to be cleaned and recycled can be reutilized, and the cost increase caused by frequent replacement is avoided. Furthermore, according to the chemical filter element cleaning method provided by the invention, the filter element is soaked by adopting hydrogen peroxide of the preset concentration, and the high polymer organic matters attached to the interior of the filter element to be cleaned and recycled can be subjected to oxidative decomposition, so that the high polymer organic matters are eliminated. Therefore, the filter element to be cleaned and recycled can be restored to a serviceable condition, and the cost is reduced.
Description
technical field [0001] The invention relates to the field of semiconductor manufacturing, in particular to a filter element chemical cleaning device and a cleaning method. Background technique [0002] In the manufacturing process of ultrapure water, RO membrane is an important treatment unit. Before RO, a safety filter is usually used. The safety filter uses a filter element as a filter medium to filter some particles and other pollutants in the water. Under the condition of a certain pressure difference between the inlet and outlet of the safety filter, the fine physical particles are intercepted and separated to achieve the purpose of removing particulate matter. During the use of the safety filter, with the increase of the retentate, the pressure difference between the inlet and outlet of the filter element will gradually increase. Usually in the water treatment system, the filter element needs to be replaced when the defined pressure difference is greater than 0.1MPa. ...
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CPCB01D41/00B01D2201/085
Inventor 黄磊建发李鹏缪俊
Owner SHANGHAI HUAHONG GRACE SEMICON MFG CORP