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Macro-scale preparation method of graphene quantum dots with controllable size

A graphene quantum dot, macro-scale technology, applied in the direction of graphene, chemical instruments and methods, nanotechnology for materials and surface science, etc., can solve the problems of limited promotion, achieve simple and easy process, easy to promote, The effect of high yield

Active Publication Date: 2017-12-05
SHANGHAI UNIV
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Problems solved by technology

Other more special methods, such as electron beam etching and ruthenium-catalyzed fullerene cage opening method, require harsh preparation conditions to a large extent, which limits the promotion of these methods

Method used

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  • Macro-scale preparation method of graphene quantum dots with controllable size

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Embodiment Construction

[0016] Preferred embodiments of the present invention are described in detail as follows:

[0017] In this example, see figure 1 , a method for mass-preparing graphene quantum dots with controllable size, comprising the steps of:

[0018] a. Deposit 20nm thick copper on the cleaned silicon wafer by thermal evaporation;

[0019] b. Etching the copper film to realize the preparation of patterned copper with a pitch of 30nm and a size of 30*30nm;

[0020] c. Place the substrate obtained in step b in a PECVD furnace, evacuate until the pressure in the reaction chamber drops below 0.1 Pascal, feed methane with a flow rate of 10 sccm, hydrogen at 10 sccm, heat up to 500°C, and keep the temperature at 200 Pascal for 10 minutes. Cut off methane and cool to room temperature under the condition of constant hydrogen flow;

[0021] d. Take out the combination of silicon wafer / copper / graphene quantum dots obtained in step c, place the concentration in ferric nitrate solution of 0.1g / ml,...

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Abstract

The invention discloses a method for mass-preparing graphene quantum dots with a controllable size, comprising the following steps: a. depositing a catalyst metal thin film on a substrate; b. Etching the metal film to make a nano-scale patterned metal catalyst; c. placing the substrate in a chemical vapor deposition reaction chamber, and feeding a carbon source and a reducing gas at a high temperature to make graphene quantum dots on the nano-metal catalyst; d. Cool to room temperature in a reducing atmosphere, take out the substrate and place it in a nano metal etching solution to obtain quantum dots suspended in the solution. The invention uses CVD method to prepare graphene quantum dots, realizes the macro-preparation of quantum dots; adopts etching process to obtain nanoscale patterned metal as a catalyst, realizes the precise and controllable size of graphene quantum dots by controlling the size of the catalyst, and improves Increased productivity and reduced costs.

Description

technical field [0001] The invention relates to a method for preparing graphene, in particular to a method for preparing graphene quantum dots, which is applied in the technical field of quantum dot synthesis. Background technique [0002] Graphene quantum dot (Graphene quantum dot) is a quasi-zero-dimensional nanomaterial, and the movement of electrons in it is restricted in all directions, so the quantum confinement effect is particularly significant and has many unique properties. Graphene quantum dots have important potential applications in the fields of biology, medicine, materials, and new semiconductor devices. It can realize single-molecule sensors, and it may also lead to ultra-small transistors or on-chip communication using semiconductor lasers to make chemical sensors, solar cells, medical imaging devices, or nanoscale circuits. [0003] The synthesis methods of graphene quantum dots are mainly divided into two categories: top-down and bottom-up methods. The b...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C01B32/186C09K11/65B82Y30/00
Inventor 杨连乔冯伟刘亚男张建华
Owner SHANGHAI UNIV