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Gas pressure controller

A gas pressure and controller technology, which is applied in the direction of electric fluid pressure control, flow control, control/regulation system, etc., and can solve problems such as performance degradation of MEMS components

Active Publication Date: 2015-09-30
SHIMADZU SEISAKUSHO CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Therefore, when the MEMS element is mounted on a metal channel substrate, since the difference between the linear expansion coefficient of silicon constituting the MEMS element and the linear expansion coefficient of the metal of the channel substrate is large, the following problems arise: Stress is applied to the MEMS component, and the performance of the MEMS component is degraded

Method used

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  • Gas pressure controller
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Examples

Experimental program
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Embodiment Construction

[0041] use figure 1 and figure 2 A gas pressure controller according to one embodiment is schematically shown. The insulating substrate 2 has an internal flow path, and a gas inlet 4 and a gas outlet 6 connected to the internal flow path are formed on one surface of the substrate 2 . The insulating substrate 2 is an alumina ceramic substrate here, but may be a substrate made of resin such as polyimide used in multilayer wiring boards, or other insulating materials such as glass.

[0042] Since the substrate 2 has an internal flow path, it is preferably a laminate including a plurality of insulating substrate layers. In this example, if figure 2 As shown, it includes alumina ceramic substrate layers 2-1 to 2-3 with a thickness of about 0.1 mm to 0.5 mm. The substrate layer 2-3 is the lowermost layer, the substrate layer 2-2 is the intermediate layer, and the substrate layer 2-1 is the uppermost layer. They are laminated and sintered to form an integral body. exist fig...

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Abstract

The present invention is provided with: an insulating substrate (2) having a gas inlet (4), a gas outlet (6), and an internal flow channel; a valve mechanism including a MEMS valve element (14) that is directly mounted to the front surface or back surface of the insulating substrate (2) and that is connected to the internal flow channel via a port passing through the internal flow channel; a pressure sensor part including a MEMS pressure sensor element (16) that is directly mounted to the front surface or back surface of the insulating substrate (2) and that is connected to the internal flow channel via a port passing through the internal flow channel; and a controller (22) for performing feedback control on the valve mechanism on the basis of a detection signal from the pressure sensor part.

Description

technical field [0001] The present invention relates to a gas pressure controller for controlling the flow rate of a carrier gas and controlling the flow rate of a gas supplied to a detector, for example, in an analysis device such as a gas chromatograph. Background technique [0002] In analysis by a gas chromatograph, the flow rate of a carrier gas for sending a sample to a separation column and the flow rate of a gas supplied to a detector need to be kept constant. To this end, the following operations are carried out: a gas pressure controller is installed at the position where the decompressed gas is supplied from the gas cylinder to the gas chromatograph, and a pressure valve and a pressure sensor are installed in the gas pressure controller, wherein the pressure valve For adjusting the pressure of the gas supplied from the gas cylinder, the pressure sensor detects the pressure of the flow path on the outlet side of the pressure valve, and controls the pressure valve s...

Claims

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Application Information

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IPC IPC(8): G05D16/20
CPCG05D7/0694Y10T137/7761F16K31/004
Inventor 樫原稔高桥一法柳林润西本尚弘
Owner SHIMADZU SEISAKUSHO CO LTD