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A kind of preparation method of ag, n co-doped tio2 nano film and its application of nano film

A nano-film, co-doping technology, applied in the direction of light water/sewage treatment, can solve the problems of low photocatalytic performance, complex preparation process, poor repeatability, etc. The effect of catalytic performance

Inactive Publication Date: 2017-06-06
山西省分析科学研究院
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0006] The purpose of the present invention is to solve the technical problems of complex preparation process, difficult process control, poor repeatability and low photocatalytic performance existing in the existing method for preparing titanium dioxide thin film, and to provide a method with simple preparation process and high photocatalytic activity. Ag, N co-doped TiO 2 Preparation method of nano film and application of nano film

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  • A kind of preparation method of ag, n co-doped tio2 nano film and its application of nano film

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0019] Experimental materials and reagents: 99.99% pure Ag target, TiO 2 Target, experimental substrate common glass (20mm×20mm); acetone (chemically pure), ethanol (chemically pure) and deionized water.

[0020] The JGP5601 magnetron sputtering apparatus developed by Shenyang Keyi Research Center Co., Ltd., Chinese Academy of Sciences was used to prepare thin films by magnetron sputtering. Concrete preparation method and steps are:

[0021] (1) The glass substrate is ultrasonically cleaned in acetone, ethanol and deionized water for 5-30 minutes before use, and dried for later use;

[0022] (2) Put the glass substrate on the sample stage in the sputtering chamber, and evacuate to 8×10 -4 Below Pa, argon gas is introduced, the reaction pressure in the sputtering chamber rises to 3.2-4.3Pa, and the Ag target is pre-sputtered for 2-5 minutes to remove the oxide on the surface of the target;

[0023] (3) Continue to feed argon gas in the sputtering chamber, keep the reaction p...

Embodiment 2

[0027] Experimental raw materials and reagents and magnetron sputtering apparatus are the same as embodiment 1.

[0028] The difference between this embodiment and embodiment 1 is that in step (3), the distance between the Ag target and the glass substrate is 50 mm, and the sputtering time is 3 min, so that a single layer of Ag with a thickness of 50 nm is obtained. Thin film; In step (4), the TiO 2 The distance between the target and the glass substrate with a single-layer Ag thin film is 35mm, and the sputtering time is 5min to obtain Ag and N-doped TiO with a thickness of 210nm. 2 Double-layer film; in step (5), anneal at 400°C to 500°C for 3h to obtain Ag and N co-doped TiO with a thickness of 240nm 2 single layer film. All the other steps are the same as in Example 1.

Embodiment 3

[0030] Experimental raw materials and reagents and magnetron sputtering apparatus are the same as embodiment 1.

[0031] The difference between this embodiment and embodiment 1 is that in step (3), the distance between the Ag target and the glass substrate is 60mm, and the sputtering time is 4min, so that a single layer of Ag with a thickness of 80nm is obtained. Thin film; In step (4), the TiO 2 The distance between the target and the glass substrate with a single-layer Ag thin film is 40mm, and the sputtering time is 6min to obtain Ag and N-doped TiO with a thickness of 330nm 2 Double-layer film; in step (5), anneal at 400°C to 500°C for 4h to obtain Ag and N co-doped TiO with a thickness of 380nm 2 single layer film. All the other steps are the same as in Example 1.

[0032] Ag, N co-doped TiO prepared in the above-mentioned Examples 1-3 2The nanometer monolayer film can be applied to the photocatalytic degradation of liquid-phase dyes.

[0033] In order to show that t...

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Abstract

The invention relates to a preparation method of an Ag and N co-doped TiO2 nano-film and application of the nano-film. The aim of the invention is to solve the technical problems of complex preparation process, poor repeatability and low photocatalytic performance in the traditional methods. A technical scheme adopted in the invention comprises: placing a glass substrate on a sample stage in a magnetic control sputtering apparatus; vacuumizing a sputtering chamber to at least 8*10<-4 >Pa, introducing argon to the sputtering chamber to rise the reaction pressure in the sputtering chamber to 3.2-4.3 Pa; after pre-sputtering, performing direct current sputtering with a Ag target to prepare a monolayer Ag film on the glass substrate; then radio frequency sputtering a N doped TiO2 film on the monolayer Ag film through using a TiO2 target in a mixed atmosphere of argon and nitrogen; and finally subjecting the Ag and N doped TiO2 double-layer film obtained through sputtering to annealing to obtain the Ag and N co-doped TiO2 monolayer film. The Ag and N co-doped TiO2 monolayer film prepared by the method disclosed in the invention has visible-light catalytic activity and can be applied to photocatalytic degradation of liquid-phase dyes.

Description

technical field [0001] The invention belongs to the technical field of titanium dioxide photocatalysis, in particular to a kind of Ag and N co-doped TiO 2 The preparation method of the nano film and the application of the nano film. Background technique [0002] Titanium dioxide (TiO 2 ) has excellent properties such as chemical stability, high refractive index, low cost, and non-toxicity, and is considered to be the most promising photocatalytic material. But since TiO 2 The disadvantages of wide bandgap and high photogenerated charge recombination rate limit its application. At the same time, the commonly used TiO 2 Photocatalytic materials such as powders have problems such as difficult recycling, easy agglomeration, secondary pollution, and high cost. Therefore, the development of TiO with efficient visible light response and photogenerated charge recombination rate 2 Thin-film photocatalytic materials have become an important task for current material workers. ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): B01J27/24C02F1/30
Inventor 刘一鸣马啸赵智勇高筱玲石媛孙志华庞小刚许明
Owner 山西省分析科学研究院
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