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Device for removing metal impurities from chlorosilane gas and silicon production system having same

A metal impurity and production system technology, applied in the direction of halosilane, silicon, silicon halide compounds, etc., can solve problems such as clogging equipment and pipelines, and achieve the effect of avoiding clogging

Active Publication Date: 2017-10-03
CHINA ENFI ENGINEERING CORPORATION
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  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] The main purpose of the present invention is to provide a device for removing metal impurities in chlorosilane gas and a silicon production system with it, so as to solve the problem of blockage of equipment and equipment caused by precipitation of metal impurities in chlorosilane gas as the temperature decreases in the prior art. plumbing problem

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  • Device for removing metal impurities from chlorosilane gas and silicon production system having same
  • Device for removing metal impurities from chlorosilane gas and silicon production system having same
  • Device for removing metal impurities from chlorosilane gas and silicon production system having same

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Embodiment Construction

[0029] It should be noted that, in the case of no conflict, the embodiments in the present application and the features in the embodiments can be combined with each other. The present invention will be described in detail below with reference to the accompanying drawings and examples.

[0030] Such as figure 1 and figure 2 As shown, the present embodiment provides a device for removing metal impurities of chlorosilane gas, the device includes a cylinder body 10, a cooling water jacket 20 and a baffle assembly 30, wherein the cooling water jacket 20 is sleeved on the cylinder body 10, and the cooling water jacket 20 forms a cooling channel surrounding the cylinder body 10, the cooling water circulates in the cooling water channel to cool down the chlorosilane gas flowing in the cylinder body, and the baffle assembly 30 is detachably installed on the cylinder body In the communication cavity of the body 10, the baffle component 30 is used to delay the flow of chlorosilane gas...

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Abstract

The invention provides a device for removing metal impurities from chlorosilane gas and a silicon production system with the device. The device for removing metal impurities from chlorosilane gas includes: a cylinder body; a cooling water jacket, which is sleeved on the cylinder body and forms a cooling channel around the cylinder body; a baffle assembly, which is detachably Installed in the communication chamber of the cylinder body, the baffle component is used to delay the flow of chlorosilane gas in the communication chamber. The application of the technical scheme of the invention can solve the problem in the prior art that the metal impurities in the chlorosilane gas are precipitated as the temperature decreases and cause blockage of equipment and pipelines.

Description

technical field [0001] The invention relates to the field of polysilicon production, in particular to a device for removing metal impurities from chlorosilane gas and a silicon production system with the same. Background technique [0002] At present, in the polysilicon production process, more than 90% of the polysilicon enterprises use silicon tetrachloride cold hydrogenation technology to treat by-products and convert them into trichlorosilane, the raw material for polysilicon production. Silicon tetrachloride cold hydrogenation technology is to react metallurgical-grade silicon powder, hydrogen, and silicon tetrachloride under the action of a catalyst under certain temperature and pressure conditions to generate trichlorosilane. Since the raw material metallurgical grade silicon powder contains metal impurities, the gas from the hydrogenation reactor (ie, chlorosilane gas) contains a certain amount of metal impurities (such as aluminum, iron, nickel, etc.). These metal ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C01B33/107C01B33/03
Inventor 曾晓国万烨严大洲杨永亮
Owner CHINA ENFI ENGINEERING CORPORATION