Method for repairing photomask pattern

Abstract

The invention provides a method for repairing a photomask pattern. The repairing method comprises the steps as follows: a photomask is provided, wherein the photomask comprises a transparent substrate and a shading layer; the shading layer is arranged on the transparent substrate and has a mask pattern; the mask pattern comprises a to-be-repaired part; the transparent substrate is etched; a groove which has the same pattern as the to-be-repaired part is formed in the position corresponding to the to-be-repaired part; a repair material is deposited into the groove; and the photomask pattern is repaired. The groove is fabricated in the transparent substrate and is filled with the repair material, so that stable combination of the repair material and the transparent substrate is ensured after repairing is ended; the repair material can endure a high-strength cleaning process; the repair material is prevented from being defected again; the reliability of the photomask is ensured; and the productive rate of the photomask is improved.

Description

technical field [0001] The invention relates to the technical field of semiconductor manufacturing, in particular to a method for repairing a photomask pattern. Background technique [0002] Photolithography is a particularly important step in semiconductor device processing. The essence of photolithography is to replicate the circuit structure on the wafer to be etched later. The circuit structure is first made in a certain proportion in the form of graphics on a transparent substrate called a photomask. The light source transfers the graphics to the photoresist of the wafer through the photomask. After development, the subsequent etching steps Imaging the pattern on the underlying film of the wafer. [0003] It can be seen that in the photolithography step, the light source copies the pattern to the photoresist layer of the wafer substrate through the photomask. Therefore, it is necessary to make patterns on the photomask. At present, there are mainly two types of phot...

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Problems solved by technology

[0007] In view of the above-mentioned shortcomings of the prior art, the object of the present invention is to provide a method for repairing a photomask pattern, which is used to solve the problem that the repaired photomask pattern in the prior art is easily washed off again in the cleaning process, resulting in The pattern is missing again

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