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Laser direct-write lithography machine precise temperature control method

A temperature control method, laser direct writing technology, applied in temperature control, non-electric variable control, control/regulation system, etc., can solve problems such as error, unstable temperature of laser direct writing lithography machine, etc.

Active Publication Date: 2015-12-23
HEFEI CHIP FOUND MICROELECTRONICS EQUIP CO LTD
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  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] The present invention provides a method of how to accurately control the temperature of the exposure area of ​​a laser direct writing lithography machine during scanning exposure, so as to solve the error problem caused by the unstable temperature of the laser direct writing lithography machine during the exposure process

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  • Laser direct-write lithography machine precise temperature control method
  • Laser direct-write lithography machine precise temperature control method
  • Laser direct-write lithography machine precise temperature control method

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Embodiment Construction

[0032] A preferred embodiment of the present invention will be described in detail below with reference to the accompanying drawings.

[0033] figure 1 It shows a schematic structural view of the temperature control system of the laser direct-writing lithography machine of the present invention, and the temperature control system of the laser direct-writing lithography machine includes a water-cooling device 1 with a communication port, and a condenser for heat exchange A fan filter unit 2, a high-precision temperature sensor 3 with a communication port, and an industrial computer 4 with a certain real-time response to commands.

[0034] The temperature sensor 3 is installed on the exposure area 5 of the laser direct writing lithography machine, and the fan filter unit 2 is installed on the top of the machine for air circulation. The temperature of the exposure area in the machine is controlled at the target temperature. The temperature sensor 3 and the water cooling device...

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Abstract

The invention provides a laser direct-write lithography machine precise temperature control method. The method comprises the steps that the current temperature of an exposure area and the current temperature of a water outlet of a water cooling device are collected; the temperature change curve of the exposure area is fitted; the theoretical target temperature of the water outlet of the water cooling device is calculated; the temperature set value of the water outlet of the water cooling device is adjusted; the temperature of the water outlet of the water cooling device is monitored, and the temperature change curve of the water outlet of the water cooling device is fitted; and the current temperature of the water outlet of the water cooling device is fine-tuned. According to the invention, the problem of high latency in a temperature control system is solved; the ambient temperature of the exposure area of a laser direct-write lithography machine is stably and precisely controlled; and finally the temperature of a target area is stably controlled at + / -0.1 DEG C.

Description

technical field [0001] The invention relates to the technical field of environment control of a laser direct-writing photolithography machine, in particular to an accurate temperature control method for a laser direct-writing photolithography machine. Background technique [0002] Photolithography is used to print a pattern of features on the surface of a substrate. Such substrates may include chips used in the manufacture of semiconductor devices, various integrated circuits, flat panel displays (eg, liquid crystal displays), circuit boards, biochips, micromechanical electronic chips, optoelectronic circuit chips, and the like. [0003] In the laser direct writing exposure process, the substrate is placed on the substrate table of the precision motion platform, and the pattern exposure is realized through the scanning movement of the exposure device and the platform in the lithography equipment and the corresponding change of the pattern generator. For the precision of...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G05D23/20G03F7/20
Inventor 陆敏婷
Owner HEFEI CHIP FOUND MICROELECTRONICS EQUIP CO LTD
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