High-throughput particle production using a plasma system

A plasma and plasma gun technology, applied in the field of high-yield particle production using plasma systems, can solve the problems of low efficiency of industrial-scale production of nanoparticles, mass/volume output limitations, etc.

Active Publication Date: 2016-01-27
SDC MATERIALS
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

These systems usually have strict limitations on mass / volume throughput
This makes industrial-scale production of nanoparticles of consistent quality and size inefficient

Method used

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  • High-throughput particle production using a plasma system
  • High-throughput particle production using a plasma system
  • High-throughput particle production using a plasma system

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Embodiment Construction

[0043] A typical nanoparticle production system can produce nanoparticles by feeding material into a plasma stream, thereby vaporizing the material and allowing the produced reacting plasma mixture to cool and condense into nanoparticles and composite or "nano-on-nano" -on-nano)" particles. The particles can then be collected for use in various applications. Preferred nanoparticles and "nano-on-nano" particles are described in US Application Serial No. 13 / 801,726, the entire description of which is incorporated herein by reference.

[0044] The present convex disclosure relates to both particles and powders. These two terms are equivalent, except that the singular "powder" refers to a collection of particles. The present invention can be applied to various powders and particles. Those skilled in the art will appreciate that the terms "nanoparticles" and "nano-sized particles" generally encompass particles with diameters on the nanometer scale, typically between about 0.5 nm...

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Abstract

The present disclosure relates to a nanoparticle production system and methods of using the system. The nanoparticle production system includes a plasma gun including a male electrode, a female electrodes and a working gas supply configured to deliver a working gas in a vortexing helical flow direction across a plasma generation region. The system also includes a continuous feed system, a quench chamber, a cooling conduit that includes a laminar flow disruptor, a system overpressure module, and a conditioning fluid purification and recirculation system.

Description

[0001] Cross References to Related Applications [0002] This application asserts U.S. Provisional Patent Application No. 61 / 784,299 filed on March 14, 2013, U.S. Provisional Patent Application No. 61 / 864,350 filed on August 9, 2013, and U.S. Provisional Patent Application No. 61 / 864,350 filed on October 2, 2013 Application No. 61 / 885,988, U.S. Provisional Patent Application No. 61 / 885,990 filed October 2, 2013, U.S. Provisional Patent Application No. 61 / 885,996 filed October 2, 2013, and U.S. Provisional Patent Application No. 61 / 885,996 filed October 2, 2013 Priority claim to U.S. Provisional Patent Application No. 61 / 885,998. The entirety of such application is incorporated herein by reference. technical field [0003] The present invention relates to systems and methods for providing high throughput particle production using plasma. Background technique [0004] Nanoparticles may be formed using a plasma production system in which one or more feed materials are fed int...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H05H1/42
CPCH05H1/42
Inventor M·A·比博格D·利蒙F·P·莱曼P·勒菲弗
Owner SDC MATERIALS
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