A developer solution constant temperature maintenance pipeline system

Abstract

The invention belongs to the field of semiconductor even glue developing, and specifically relates to a developing liquid constant temperature maintaining pipeline system. The outlet of a thermal insulation water circulating system enters a developing unit through a water inlet pipe and is connected to a liquid collecting block, a developing liquid pipe that is connected to a developing liquid source enters the developing unit and is connected to the liquid collecting block, a water-liquid separation type liquid valve, and a liquid dividing block; the developing liquid pipe arranged between the liquid collecting block and the water-liquid separation type liquid valve and the developing liquid pipe arranged between the liquid dividing block and the water-liquid separation type liquid valve are both provided with a thermal insulation water sleeve; thermal insulation water provided by the thermal insulation water circulation system flows between the thermal insulation water sleeve and the developing liquid pipe; the thermal insulation water, which flows out from the liquid dividing block, enters one cavity of a nozzle and is communicated with the thermal insulation water circulating system through a water return pipe; the developing liquid that flows out from the liquid dividing block enters the other cavity of the nozzle and is sprayed on the surface of wafers. Through the provided system, after the developing liquid enters the developing unit, the developing liquid is completely soaked in thermal insulation water, the exposure of developing liquid to external space is avoided, and thus the influences of other factors on developing liquid are reduced.

Description

technical field [0001] The invention belongs to the field of uniform rubber development of semiconductors, and in particular relates to a pipeline system for maintaining a constant temperature of a developer, which is used to control the temperature of the developer in single-chip wet processing equipment for integrated circuit manufacturing. Background technique [0002] At present, in the semiconductor wafer production process, in order to meet the increasingly stringent process requirements, it is necessary to strictly control all aspects of the equipment, and the temperature control of the developer is the top priority. Developing is the most important step in the coating development equipment. Since the developer is particularly sensitive to temperature, exceeding the specified range will have a great impact on the process, which may cause the entire wafer process to start from scratch, seriously affecting production capacity and affecting economic benefits. But now the...

AI Technical Summary

Problems solved by technology

Developing is the most important step in the coating development equipment. Since the developer is particularly sensitive to temperature, exceeding the specified range will have a great impact on the process, which may cause the entire wafer process to start from scratch, seriously affecting production capacity and affecting economic benefits.

However, the heat preservation of the developer is only partially or double-layered, making it difficult to control the impact of the return water on the heat preservation water.

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