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Quick Response Flow Through Device

A fast-response, pressure-resistant tube technology, applied in the direction of valve devices, safety valves, functional valves, etc., can solve the problems of air flow field quality influence, unfavorable high-speed air flow, poor pressure controllability, etc., to shorten the time for channel formation , Improve the response speed, the effect of short after-effect period

Active Publication Date: 2018-07-31
NANJING UNIV OF SCI & TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] 1. There is a certain time lag between the ignition of gunpowder and the formation of pressure, and the response of channel formation is slow
[0006] 2. The gunpowder combustion method is used to generate pressure, and the pressure controllability is poor
[0007] 3. The post-combustion period and unburned powder particles have a great influence on the quality of the airflow field, which is not conducive to the formation of stable high-speed airflow

Method used

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Embodiment

[0039] A fast-response flow-through device

[0040] The pressure in the high-pressure air chamber 1 is 6MPa, and at the outlet nozzle 8, the initial pressure is a standard atmospheric pressure. The high-pressure gas chamber, the pressure-resistant pipe and the outlet nozzle are reliably connected by the connecting flange, and the octagonal metal sealing ring gasket is used to seal the flange connection. The pressure diaphragm is sealed inside the pipeline by the metal ring gasket to ensure that the entire pipeline Has good air tightness. The plasma generator 5 is fixed to the circumferential direction of the pressure-resistant tube 4 by the plasma generator fixing device 6 through screw connection, and the plasma generator 5 is sealed with the pressure-resistant tube 4 through the tapered surface. The one-way valve 10 and the pressure reducing valve 11 are connected in the circumferential direction of the pressure-resistant pipe 4 through pipe threads. The entire flow line i...

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Abstract

The invention discloses a quick response venting device which comprises a pressure-resistant pipe connected between two pipelines, a high voltage terminal pressure diaphragm which is arranged between a high pressure air chamber and the pressure-resistant pipe and is damaged under certain pressure, a low voltage terminal pressure diaphragm which is arranged between the pressure-resistant pipe and an outlet spray pipe and is damaged under certain pressure, a plasma generator which is arranged on the outer wall of the pressure-resistant pipe and of which an igniting primer end is communicated with the inner cavity of the pressure-resistant pipe, a reducing valve which is arranged on the outer wall of the pressure-resistant pipe and is communicated with the inner cavity of the pressure-resistant pipe, and a one-way valve which is arranged on the outer wall of the pressure-resistant pipe and is communicated with the inner cavity of the pressure-resistant pipe. According to the quick response venting device, the response is quick, the pressure is controllable, and the influence to follow-up flow is small.

Description

technical field [0001] The invention belongs to the technical field of pipeline flow control, in particular to a quick-response flow-through device. Background technique [0002] At present, in the study of the flow field shape under the condition of high-speed incoming flow, the indirect shadow method, as an important visualization method, provides a strong technical support for its theoretical research. There are complex shock wave systems in the flow field of high-speed incoming flow. The shock wave system will make the density distribution of the flow field uneven. When the light passes through the shock wave structure, it will be refracted and shifted, resulting in shadows, so as to realize the visualization of the flow field. It provides important data for the flow field research under the condition of high-speed incoming flow. However, it can also be seen that this method has extremely high requirements for the quality of the flow field, and the particle impurities i...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): F16K17/40
CPCF16K17/403
Inventor 王争论朱黎黄楠
Owner NANJING UNIV OF SCI & TECH