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Colored film photoresist coating device

A technology of gluing device and color film, applied in nonlinear optics, instruments, optics, etc., can solve the problems of poor probe positioning accuracy, long time required, and high risk of foreign matter generation, and achieve flexible and simple operation and improved positioning. The effect of precision, improved work efficiency and product quality

Active Publication Date: 2016-02-24
WUHAN CHINA STAR OPTOELECTRONICS TECH CO LTD
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  • Abstract
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Problems solved by technology

[0013] The invention provides a color film gluing device, which mainly solves the problem of poor positioning accuracy of probes in the production of glass substrates whose pattern format has been changed in the prior art, takes too long for on-site operations, and has a high risk of foreign matter, which affects product quality. technical issues

Method used

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  • Colored film photoresist coating device
  • Colored film photoresist coating device
  • Colored film photoresist coating device

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Embodiment Construction

[0034] The present invention will be described in further detail below in conjunction with the accompanying drawings and embodiments. In particular, the following examples are only used to illustrate the present invention, but not to limit the scope of the present invention. Likewise, the following embodiments are only some but not all embodiments of the present invention, and all other embodiments obtained by persons of ordinary skill in the art without creative efforts fall within the protection scope of the present invention.

[0035] see figure 2 , figure 2 It is a perspective view of the automatic positioning support mechanism of the color film gluing machine according to an embodiment of the present invention. The color film gluing device of the present invention includes an automatic positioning support mechanism 1, the automatic positioning support mechanism 1 is used to support the glass substrate, and the automatic positioning support mechanism 1 includes two bra...

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Abstract

The invention provides a colored film photoresist coating device. The device comprises an automatic positioning and supporting mechanism, wherein the automatic positioning and supporting mechanism comprises two supports, a horizontal supporting component, a movable probe component and a horizontal driving component, and the two supports are oppositely arranged in parallel in a spaced mode; the horizontal supporting component is movably erected between the two supports, the movable probe component is in transmission connection with the horizontal supporting component in a threaded mode, and the horizontal driving component is arranged at the end of a horizontal sliding component so as to enable the movable probe component to move horizontally on the horizontal supporting component in a screw driving mode, so that the position of the movable probe component on the horizontal supporting component is changed; in this way, during production of glass substrates with pattern format changed, the position of the movable probe component on the horizontal supporting component can be automatically adjusted, probe positioning precision is improved, operation is flexible and easy, and working efficiency and product quality are improved.

Description

technical field [0001] The invention relates to the technical field of liquid crystal display manufacture, in particular to a color film gluing device. Background technique [0002] The color film gluing machine in the prior art is mainly responsible for vacuum drying after the glass substrate on the panel is coated with colored photoresist (ie, photoresist), and then the dried glass substrate is exposed, developed, and baked. After baking, the final glass substrate forms a specific pattern format. Every time the pattern format on the glass substrate is changed in size, the substrate color film gluing machine must rearrange the positions of the independent support probes of the substrate color film gluing machine according to the design of the pattern template, and adjust to the debugging between panels area, so as to prevent pattern unevenness caused by uneven placement of probes 102 in the pattern format formed after baking. [0003] In the prior art, when producing a gl...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G02F1/13G02F1/1335
CPCG02F1/1303G02F1/1335
Inventor 刘汉辰徐彬徐涛
Owner WUHAN CHINA STAR OPTOELECTRONICS TECH CO LTD
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