Low resistance pressure equalizing mask with buffer cavity
A buffer cavity and mask technology, applied in the field of masks, can solve the problems of increasing the transmission probability of micro particles, reducing the effective filtering area of the filter, and small extensibility of the filter, so as to reduce the transmission probability of micro particles and reduce the The probability of particle penetration and avoiding the effect of high intake air
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[0054] Embodiments of the present invention are as Figures 1 to 4 As shown, the low-resistance pressure equalizing mask with a buffer chamber is provided with a layer of filter sheet 1, and the inner side of the filter sheet 1 is provided with a buffer sheet 2 located at the front of the mouth and nose to cover the position of the mouth and nose, and the upper and lower ends of the buffer sheet 2 The edges are respectively fixedly connected to the upper and lower edges of the filter sheet 1, and the left and right sides are open to the air. There is a gap between the buffer sheet 2 and the filter sheet 1 to form a first cavity, and the two sides of the filter sheet are connected with fixed belts 3; the filter sheet Materials with different filter pores can be selected according to different working environment requirements. In this embodiment, melt-blown non-woven fabrics are used, according to Figure 4 The cutting shown is similar to a pair of wings, which are left and righ...
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