Online measurement method for film layer uniformity of transparent medium and apparatus therefor

Abstract

The invention discloses an online measurement method and device for the uniformity of a film layer of a transparent medium. The measurement method includes: obtaining the reflection spectrum of the film surface at each point; analyzing the optical performance of the reflection spectrum of the film surface at each point; obtaining the refractive index of the film layer and The average thickness of the film layer; the uniformity distribution result of the film layer thickness is obtained after the uniformity analysis. The invention also discloses an online spectrum measuring device, which includes a bracket, a guide rail is arranged on the bracket, a measuring probe is arranged on the guide rail, a first position sensor is arranged on the bracket on one side of the guide rail, and a first position sensor is arranged on the other side of the guide rail. The bracket is provided with a second position sensor. When the first position sensor and the second position sensor detect the coating sample to be tested at the same time, the measuring probe moves step by step along the guide rail above the coating sample to scan the test point by point. It is used to test the reflectance spectrum of each point of the coating sample to be tested. The invention can simultaneously obtain the refractive index and the average thickness of the film, is not affected by the type of the film, and has universal performance.

Description

technical field [0001] The invention relates to the field of coated glass, in particular to an online measurement method and a device thereof for the uniformity of a film layer of a transparent medium. Background technique [0002] Off-line Low-E (Low-E) coated glass has been widely used because of its good energy-saving performance. At present, the production of Low-E coated glass adopts the magnetron sputtering method, and the glass is sequentially passed through the magnetron sputtering with different targets. Cathodic deposition produces the corresponding film layer, and finally constitutes the Low-E coating film system. At present, the maximum width that can produce coated glass is 3300mm, and the cathode size is more than 200mm larger than the glass width. The off-line Low-E coated glass film has a complex structure, with more than 5 layers. The uniformity of each cathode and each layer process in the width direction has a crucial impact on the uniformity of the final...

AI Technical Summary

Problems solved by technology

[0004] Chinese patent 00224940 proposes a device for online detection of film thickness uniformity. This device only uses 650nm or 800nm ​​light waves to analyze the relative changes in the transmitted light intensity of the measured film layer to obtain the relative distribution of film thickness, rather than each point. In addition, due to the interference phenomenon of the thin film, the transmission intensity at a certain light wavelength point will change periodically with the thickness change, so this method can only be used for the relative thickness analysis in the same interference cycle, and there are limitations Chinese patent 93117694 proposes a kind of method and device of monitoring film thickness equally, is used for measuring the uniformity of transparent coating, and this patent is to utilize each wavelength point in two ranges of 400~480nm and 580~750nm, measure this Comparing the reflected light intensity at the two wavelength points with the set threshold value, the change of the relative thickness of the film layer is obtained, and different analysis methods need to be selected according to the film layer with different performance and its color characteristics. This method is not universal. Complicated, not conducive to promotion in production enterprises

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