On-line measurement method and device for uniformity of transparent medium film layer

Abstract

The invention discloses an online measurement method for film layer uniformity of a transparent medium and an apparatus therefor. The measurement method includes the following steps: 1) acquiring a film surface reflection spectrum of every point; 2) performing optical performance analysis to the film surface reflection spectrum of every point; 3) acquiring film layer refractive index and film layer average thickness; and 4) performing uniformity analysis to obtain a film layer thick uniformity distribution result. The invention also discloses an online spectrum measurement apparatus which comprises a support and a guide rail arranged thereon. A measurement probe is arranged on the guide rail. A first position sensor is arranged on the support at one side of the guide rail, and a second position sensor is arranged on the support at the other side of the guide rail. When the two position sensors detect a to-be-tested film-plated sample at the same time, the measurement probe performs scanning test point-by-point above the to-be-tested film-plated sample along the step motion of the guide rail, thereby measuring the film surface reflection spectrum of every point in the to-be-tested film-plated sample. The method can obtain the film layer refractive index and the film layer average thickness at the same time, is free of influence due to types of the film layers, and has universal performance.

Description

technical field [0001] The invention relates to the field of coated glass, in particular to an online measurement method and a device thereof for the uniformity of a film layer of a transparent medium. Background technique [0002] Off-line Low-E (Low-E) coated glass has been widely used because of its good energy-saving performance. At present, the production of Low-E coated glass adopts the magnetron sputtering method, and the glass is sequentially passed through the magnetron sputtering with different targets. Cathodic deposition produces the corresponding film layer, and finally constitutes the Low-E coating film system. At present, the maximum width that can produce coated glass is 3300mm, and the cathode size is more than 200mm larger than the glass width. The off-line Low-E coated glass film has a complex structure, with more than 5 layers. The uniformity of each cathode and each layer process in the width direction has a crucial impact on the uniformity of the final...

AI Technical Summary

Problems solved by technology

[0004] Chinese patent 00224940 proposes a device for online detection of film thickness uniformity. This device only uses 650nm or 800nm ​​light waves to analyze the relative changes in the transmitted light intensity of the measured film layer to obtain the relative distribution of film thickness, rather than each point. In addition, due to the interference phenomenon of the thin film, the transmission intensity at a certain light wavelength point will change periodically with the thickness change, so this method can only be used for the relative thickness analysis in the same interference cycle, and there are limitations Chinese patent 93117694 proposes a kind of method and device of monitoring film thickness equally, is used for measuring the uniformity of transparent coating, and this patent is to utilize each wavelength point in two ranges of 400~480nm and 580~750nm, measure this Comparing the reflected light intensity at the two wavelength points with the set threshold value, the change of the relative thickness of the film layer is obtained, and different analysis methods need to be selected according to the film layer with different performance and its color characteristics. This method is not universal. Complicated, not conducive to promotion in production enterprises

Images