Trivalent chromium electroplating solution and electroplating method
A trivalent chromium solution technology, applied in the field of electroplating, can solve the problem that the trivalent chromium coating cannot be thickened, and achieve the effects of reduced harm, good bonding force, and smooth surface
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Embodiment 1
[0037] In this embodiment, the composition of the electroplating solution: chromium chloride 0.8mol / L, formic acid 0.2mol / L, acetic acid 0.4mol / L, urea 2.0mol / L, boric acid 0.2mol / L, sodium chloride 0.5mol / L, chlorine Ammonium chloride 0.5mol / L, butynediol 6g / L, and the rest is water. Mix the above substances evenly and stir for 24 hours to prepare an electroplating solution with a pH value of 1.2. Cathode current density 30A / dm 2 , bath temperature 30 ℃, electroplating time 60min, coating thickness 70μm. This embodiment adopts chloride plating solution system and high-density graphite anode (fixed carbon content ≥ 99.99wt%, density 1.85g / cm 3 ), the coating is dense and bright.
Embodiment 2
[0039] In this embodiment, the components of the electroplating solution: chromium chloride 0.8mol / L, formic acid 0.2mol / L, acetic acid 0.4mol / L, urea 2.0mol / L, sodium chloride 0.5mol / L, ammonium chloride 0.5mol / L , boric acid 0.2mol / L, butynediol 6g / L, and the rest is water. Mix the above substances evenly and stir for 24 hours to prepare an electroplating solution with a pH value of 1.2. Cathode current density 45A / dm 2 , bath temperature 40 ℃, plating time 30min, coating thickness 45μm. This embodiment adopts chloride plating solution system and high-density graphite anode (fixed carbon content ≥ 99.99wt%, density 1.75g / cm 3 ), the quality of the middle part of the coating is better, and the end part is slightly blackened.
Embodiment 3
[0041] In this embodiment, the electroplating solution composition: chromium chloride 0.8mol / L, formic acid 0.4mol / L, glycolic acid 0.6mol / L, ammonium chloride 0.5mol / L, boric acid 0.3mol / L, sodium citrate 0.2mol / L L, polyethylene glycol 5g / L, the rest is water. Mix the above substances evenly and stir for 24 hours to prepare an electroplating solution with a pH value of 0.9. Cathode current density 40A / dm 2 , bath temperature 45 ℃, electroplating time 60min, coating thickness 50μm. This embodiment adopts chloride plating solution system and high-density graphite anode (fixed carbon content ≥ 99.99wt%, density 1.75g / cm 3 ), the coating is dense and has good bonding force.
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