A kind of method for preparing ultra-thin organosilicon film
An organosilicon and organosilicon source technology, applied in the field of preparation of ultra-thin organosilicon membranes, can solve the problems of small flux, "large membrane thickness, low film formation rate, etc., and achieve the effect of high flux or permeability.
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Embodiment 1
[0029] (1) Preparation of organosilica sol
[0030] Under the catalysis of hydrochloric acid, the organosilicon polymer sol was prepared through the hydrolysis polymerization reaction of the organosilicon source precursor BTESEthy, and its concentration was diluted to 0.3wt%;
[0031] (2) The outer tube type α-Al 2 o 3 The support body (50% porosity, average pore diameter 2μm, outer diameter 10mm, length 100mm) was preheated to 200°C and taken out, immediately dipped the pre-prepared silicon-zirconium sol (0.5wt%) with absorbent cotton, and supported it in one direction Quickly rub on the body, put it into a 550°C furnace for calcination for 20 minutes immediately after coating, repeat this process 4 times, and obtain the transition layer of the film;
[0032] (3) Take out the support body coated with the transition layer and calcined in step (2), after cooling to 200°C, use absorbent cotton to dip the BTESEthy organosilicon sol obtained in step (1) on the transition layer q...
Embodiment 2
[0034] (1) Preparation of organosilica sol
[0035] Under the catalysis of hydrochloric acid, the organosilicon polymer sol was prepared by the hydrolysis polymerization reaction of the organosilicon source precursor BTESE, and its concentration was diluted to 0.4wt%;
[0036] (2) The outer tube type α-Al 2 o 3 The support body (50% porosity, average pore diameter 2μm, outer diameter 10mm, length 100mm) was preheated to 200°C and taken out, immediately dipped the pre-prepared silicon-zirconium sol (0.5wt%) with absorbent cotton, and supported it in one direction Quickly rub on the body, put it into a 550°C furnace for calcination for 15 minutes immediately after coating, repeat this process 5 times, and obtain the transition layer of the film;
[0037] (3) Take out the support body coated with the transition layer and calcined in step (2), and after cooling to 200°C, use absorbent cotton to dip the BTESE organosilicon sol obtained in step (1) on the transition layer quickly ...
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