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Brushless rotary plasma electrode structure and film coating system

A plasma and electrode structure technology, applied in the direction of plasma, circuit, discharge tube, etc., can solve the problems of impedance rise, pollution, friction heat generation, etc., and achieve the effect of improving efficiency, high RF energy, and increasing strength

Active Publication Date: 2016-11-23
IND TECH RES INST
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the rotating electrode part 11 will rub against the carbon brush 14, so frictional heat will be generated to generate high temperature, and there may be a risk of fire under long-term operation.
[0005] Furthermore, the rubbed carbon brush 14 will also produce dust (particles), and these dusts will fall to the workpiece to cause pollution, and cause the workpiece after plasma treatment to have a problem of poor yield.
In the prior art, the dust cover is used to collect dust to reduce the probability of dust falling to the workpiece, but it still cannot solve the problem of high temperature generated by the electrode part 11 rubbing the carbon brush 14, which in turn leads to an increase in impedance
It can be seen that the carbon brush type rotating plasma electrode structure 10 of the prior art also has the problem of high impedance, which will lead to poor RF energy generated.

Method used

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  • Brushless rotary plasma electrode structure and film coating system
  • Brushless rotary plasma electrode structure and film coating system
  • Brushless rotary plasma electrode structure and film coating system

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Embodiment Construction

[0046] The specific implementation manner of the present invention will be further described below in conjunction with the accompanying drawings and embodiments. The following examples are only used to illustrate the technical solutions of the present invention more clearly, but not to limit the protection scope of the present invention.

[0047] figure 2 It is a schematic diagram of the brushless rotating plasma electrode structure of the present invention. see figure 2 . In this embodiment, the brushless rotating plasma electrode structure 100 includes a body 110 , a plurality of guiding portions 120 , an isolation portion 130 , a plurality of conducting elements 140 , an RF generator 150 and a ground electrode 160 .

[0048] The main body 110 rotates around an axis A1 . The main body 110 includes a plurality of (two in the figure) electrode portions 112 , 114 arranged at intervals, wherein the isolation portion 130 is located between the two electrode portions 112 .

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Abstract

A brushless rotary plasma electrode structure and a film coating system are disclosed. The brushless rotary plasma electrode structure includes a main body, a plurality of guided portions, and a plurality of conducting-through members. The main body further includes a plurality of electrode portions that have a first salient portion furnished at the periphery thereof. The guided portion is penetrated through the electrode portion. Each of the conducting-through members further includes a second salient portion. There is an internal in both the first salient portion and the second salient portion.

Description

technical field [0001] The invention relates to an electrode structure and a coating system, and in particular to a carbon brushless rotating plasma electrode structure and a coating system including the carbon brushless rotating plasma electrode structure. Background technique [0002] figure 1 It is a schematic diagram of the carbon brush type rotating plasma electrode structure in the prior art. see figure 1 . [0003] The conventional carbon brush rotating plasma electrode structure 10 is composed of two electrode parts 11 , two guiding parts 12 , an isolation part 13 , a carbon brush 14 made of graphite, an RF generator 15 and a ground electrode 16 . The isolation part 13 is located between the two electrode parts 11 . The guide part 12 penetrates through the two electrode parts 12 . The carbon brush 14 is arranged on the periphery of the electrode portion 11 . The RF generator 15 and the ground electrode 16 are respectively coupled to one end of the corresponding...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H05H1/46C23C16/505
CPCH01J37/32082H01J37/32532H01J37/32568H01J37/32577
Inventor 林士钦张家豪林冠宇
Owner IND TECH RES INST