Mask, substrate, display panel and display device

A mask and substrate technology, which is applied in the fields of masks, substrates, display panels and display devices, can solve the problems of different offsets, affecting production capacity, and increasing the number of alignments, so as to improve production capacity, increase stability, Avoid the effect of deformation

Active Publication Date: 2016-12-07
BOE TECH GRP CO LTD +1
View PDF4 Cites 30 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

At present, the alignment mask (Align Mask) material is INVAR36 with ferromagnetism. INVAR36 material will be magnetically adsorbed when it is in a magnetic field. The state of being adsorbed by the magnetic separator is different each time, resulting in different offsets. During the alignment process, the overall alignment times will increase due to different adsorption offsets, which will affect the production capacity
[0003] Specifically, see figure 1 The structure of the mask plate is shown, the mask plate includes a mask plate frame 1 and an alignment mask plate body 2, the mask plate frame includes a plurality of first alignment marks (not shown in the figure), and the alignment The mask body 2 includes a second alignment mark 3 correspo

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Mask, substrate, display panel and display device
  • Mask, substrate, display panel and display device
  • Mask, substrate, display panel and display device

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0039] see Figure 4 1. A mask provided by an embodiment of the present invention includes a mask frame 21 and an alignment mask body 22, and four first alignment marks (not shown in the figure) are arranged on the mask frame 21 , the alignment mask body 22 has a second alignment mark 221 corresponding to the first alignment mark, and the alignment mask body is connected to the mask frame through the welding area 222 on both sides of the second alignment mark 221 21 fixed.

[0040] In a specific embodiment, in the above mask plate provided by the embodiment of the present invention, see Figure 4 , the mask frame is rectangular, and the extension direction of the welding area 222 is parallel to the long side 211 of the mask frame. Specifically, the extension direction of the welding area is parallel to the long side of the mask frame, thereby increasing the area of ​​the welding area, and avoiding that when the alignment mask body and the mask frame are fixed, the welding ar...

Embodiment 2

[0047] see Figure 6 1. A mask provided by an embodiment of the present invention includes a mask frame 21 and an alignment mask body 22, and a plurality of first alignment marks (not shown in the figure) are arranged on the mask frame 21 , the alignment mask body 22 has a second alignment mark 221 corresponding to the first alignment mark, and the alignment mask body is connected to the mask frame through the welding area 222 on both sides of the second alignment mark 221 21 fixed.

[0048] In a specific embodiment, in the above mask plate provided by the embodiment of the present invention, see Figure 6 , the mask frame is rectangular, and the extension direction of the welding area 222 is parallel to the long side 211 of the mask frame. Specifically, the extension direction of the welding area is parallel to the long side of the mask frame, thereby increasing the area of ​​the welding area, and avoiding that when the alignment mask body and the mask frame are fixed, the ...

Embodiment 3

[0055] see Figure 7 1. A mask provided by an embodiment of the present invention includes a mask frame 21 and an alignment mask body 22, and a plurality of first alignment marks (not shown in the figure) are arranged on the mask frame 21 , the alignment mask body 22 has a second alignment mark 221 corresponding to the first alignment mark, and the alignment mask body is connected to the mask frame through the welding area 222 on both sides of the second alignment mark 221 21 fixed.

[0056] In a specific embodiment, in the above mask plate provided by the embodiment of the present invention, see Figure 7 , the mask frame is rectangular, and the extension direction of the welding area 222 is parallel to the long side 211 of the mask frame. Specifically, the extension direction of the welding area is parallel to the long side of the mask frame, thereby increasing the area of ​​the welding area, and avoiding that when the alignment mask body and the mask frame are fixed, the ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention discloses a mask, a substrate, a display panel and a display device, which are used for avoiding frequent alignment of an aligning mask, increasing stability of the aligning mask and increasing the yield. The mask comprises a mask framework and an aligning mask main body; a plurality of first aligning marks are arranged on the mark framework; the aligning mask main body is equipped with second aligning marks corresponding to the first aligning marks; and the aligning mask main body passes through welding areas at the two sides of the second aligning marks and is fixed to the mask framework.

Description

technical field [0001] The invention relates to the field of display technology, in particular to a mask, a substrate, a display panel and a display device. Background technique [0002] The fine metal mask (Fine Metal Mask, FMM Mask) mode is to vapor-deposit the electroluminescent diode (Organic Light-Emitting Diode, OLED) material to the low-temperature polysilicon (LowTemperature Poly-silicon, LTPS) according to a predetermined procedure by evaporation On the backplane, use the graphics on the FMM to vapor-deposit red, green and blue organic compounds to the specified positions. At present, the alignment mask (Align Mask) material is INVAR36 with ferromagnetism. INVAR36 material will be magnetically adsorbed when it is in a magnetic field. The state of being adsorbed by the magnetic separator is different each time, resulting in different offsets. During the alignment process, the overall alignment times will increase due to different adsorption offsets, which will affec...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
IPC IPC(8): C23C14/04H01L27/32
CPCC23C14/042H10K59/00
Inventor 林治明王震黄俊杰张健唐富强高月娇
Owner BOE TECH GRP CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap