Preparation method of high-purity polycrystalline silicon wafer
A polysilicon wafer and polysilicon technology, applied in the field of solar cells, can solve the problems of high cutting loss and high comprehensive cost of cutting and processing, and achieve the effects of improving conversion efficiency, ensuring product qualification rate, and reducing production costs
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Embodiment 1
[0020] In the embodiment of the present invention, the preparation method of high-purity polycrystalline silicon wafer comprises the following steps:
[0021] 1) Put the silicon material into a high-temperature furnace and heat it to 1300°C in a dust-free environment to keep the silicon material at the bottom of the furnace from melting, so that the silicon material remaining at the bottom of the furnace can better guide the crystal growth and control the crystal growth. Grain requirements, thereby reducing dislocations and defects, and improving product purity; polysilicon is produced through the above steps.
[0022] 2) Cut the polysilicon, and clean the surface of the cut polysilicon with a cleaning agent to effectively remove the pollutants on the surface of the silicon wafer, so that the surface of the silicon wafer is clean and uniform, which is beneficial to the texture of the silicon wafer and improves the surface purity. Product conversion efficiency is effectively im...
Embodiment 2
[0025] In the embodiment of the present invention, the preparation method of high-purity polycrystalline silicon wafer comprises the following steps:
[0026] 1) Put the silicon material into a high-temperature furnace and heat it to 1380°C in a dust-free environment to keep the silicon material at the bottom of the furnace from melting, so that the silicon seed crystals left at the bottom of the furnace can better guide the crystal growth and control the crystal growth. Grain requirements, thereby reducing dislocations and defects, and improving product purity; polysilicon is produced through the above steps.
[0027] 2) Cut the polysilicon, and clean the surface of the cut polysilicon with a cleaning agent to effectively remove the pollutants on the surface of the silicon wafer, so that the surface of the silicon wafer is clean and uniform, which is beneficial to the texture of the silicon wafer and improves the surface purity. Product conversion efficiency is effectively im...
Embodiment 3
[0030] In the embodiment of the present invention, the preparation method of high-purity polycrystalline silicon wafer comprises the following steps:
[0031] 1) Put the silicon material into a high-temperature furnace and heat it to 1320°C in a dust-free environment to keep the silicon material at the bottom of the furnace from melting, so that the silicon material remaining at the bottom of the furnace can better guide the crystal growth and control the crystal growth. Grain requirements, thereby reducing dislocations and defects, and improving product purity; polysilicon is produced through the above steps.
[0032] 2) Cut the polysilicon, and clean the surface of the cut polysilicon with a cleaning agent to effectively remove the pollutants on the surface of the silicon wafer, so that the surface of the silicon wafer is clean and uniform, which is beneficial to the texture of the silicon wafer and improves the surface purity. Product conversion efficiency is effectively im...
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