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A developing tank cleaning agent used in pcb manufacturing process
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A cleaning agent and solvent technology, applied in the field of DES development process, can solve the problems of poor cleaning effect, long cleaning time and high COD value, and achieve the effects of cost reduction, convenient storage and low corrosion.
Inactive Publication Date: 2019-01-11
珠海顺泽科技股份有限公司
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Problems solved by technology
[0005] In view of the above problems, the purpose of the present invention is to solve the defects of high COD value, long cleaning time, need to heat up, and poor cleaning effect in the developing tank cleaning agent.
Method used
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Embodiment 1
[0022] Solvent A: hydrochloric acid, sulfuric acid, citric acid, phosphoric acid, acetic acid, oxalic acid, formic acid, sulfurous acid, phosphorous acid in any proportion total 100kg, water 900kg.
[0023] Solvent B: Based on solvent A, 10kg of polyethylene glycol (accounting for 10 / 1000=1% of the mass of solvent A); 10kg of water-soluble polyether (accounting for 10 / 1000=1% of the mass of solvent A).
[0024] Stir and mix solvent A and solvent B evenly to obtain a slightly light yellow liquid developing tank cleaning agent.
Embodiment 2
[0026] Solvent A: hydrochloric acid, sulfuric acid, citric acid, phosphoric acid, acetic acid, oxalic acid, formic acid, sulfurous acid, phosphorous acid in any proportion total 100kg, water 900kg.
[0027] Solvent B: based on solvent A, polyethylene glycol 20kg (accounting for 20 / 1000=2% of the mass of solvent A); 10kg of water-soluble polyether (accounting for 10 / 1000=1% of the mass of solvent A).
[0028] Stir and mix solvent A and solvent B evenly to obtain a slightly light yellow liquid developing tank cleaning agent.
Embodiment 3
[0030] Solvent A: hydrochloric acid, sulfuric acid, citric acid, phosphoric acid, acetic acid, oxalic acid, formic acid, sulfurous acid, phosphorous acid in any proportion total 100kg, water 900kg.
[0031] Solvent B: based on solvent A, 10kg of polyethylene glycol (accounting for 10 / 1000=1% of the mass of solvent A); 20kg of water-soluble polyether (accounting for 20 / 1000=2% of the mass of solvent A).
[0032] Stir and mix solvent A and solvent B evenly to obtain a slightly light yellow liquid developing tank cleaning agent.
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Abstract
The invention provides a developing bath cleaning agent used for a manufacture procedure of PCB. Compared with the prior art, cleaning effect of original developing bath cleaning agent is greatly improved, COD value is reduced through the improvement of the developing bath cleaning agent, cleaning time is shortened by 3-4 hours, cleaning efficiency is improved, cleaning cost is reduced, and an enterprise thus obtains great market competitive advantages.
Description
technical field [0001] The invention relates to a cleaning agent for developing tanks in the PCB manufacturing process, especially used in the DES developing process of integrated circuits, printed circuit boards, carrier boards, and rigid-flex boards, the inner and outer layer development processes, and liquid crystal displays. Background technique [0002] A photoresist is a photosensitive film used to transfer an image to a substrate, a photoresist coating is formed on the substrate, and then the photoresist layer is exposed to activating radiation through a photomask source under exposure. Exposure to activating radiation provides a photoinduced chemical conversion of the photoresist coating, thereby transferring the pattern of the photomask to the photoresist-coated substrate. After exposure, the photoresist is developed to obtain a relief image. [0003] For example, in the DES development process of integrated circuits, printed circuit boards, carrier boards, flexib...
Claims
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Application Information
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