Fabric flatness objective evaluation method and fabric flatness objective evaluation device based on unsupervised machine learning

A machine learning and flatness technology, applied in the field of image processing, can solve problems such as time-consuming and labor-intensive, large subjective factors, etc., to achieve the effect of reducing errors and avoiding subjective errors

Inactive Publication Date: 2017-03-22
SUN YAT SEN UNIV
View PDF4 Cites 7 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In the process of manual evaluation, due to the large amount of collected data, the evaluation results are often different due to changes in the e

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Fabric flatness objective evaluation method and fabric flatness objective evaluation device based on unsupervised machine learning
  • Fabric flatness objective evaluation method and fabric flatness objective evaluation device based on unsupervised machine learning
  • Fabric flatness objective evaluation method and fabric flatness objective evaluation device based on unsupervised machine learning

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0045] The technical solutions in the embodiments of the present invention will be clearly and completely described below in conjunction with the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only a part of the embodiments of the present invention, rather than all the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those of ordinary skill in the art without creative work shall fall within the protection scope of the present invention.

[0046] figure 1 It is a schematic flow chart of a method for evaluating fabric flatness based on unsupervised machine learning in an embodiment of the present invention, such as figure 1 As shown, the method includes:

[0047] S1, collect sample data in a standard assessment environment;

[0048] S2, preprocessing the collected sample data to remove the background and interference information of the image;

[0049] S3, using computer image pr...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

An embodiment of the invention discloses a fabric flatness objective evaluation method and a fabric flatness objective evaluation device on unsupervised machine learning, wherein the method comprises the steps of acquiring sample data in a standard evaluation environment; preprocessing the acquired sample data, eliminating background information and interference information of an image; vectorizing the preprocessed data by means of computer image processing technology; classifying the vectorized data, and generating a characteristic reference set; and performing image class prediction on the characteristic reference set, thereby obtaining an evaluation result. In the fabric flatness objective evaluation method and the fabric flatness objective evaluation device, through extracting and abstracting a bottom-layer characteristic, a fabric image is vectorized; clustering is performed according to the characteristic of the fabric image, and a label is set for a clustering result. Through unified extraction and abstraction on the bottom layer characteristic and objective reference classification, fabric grade prediction is performed, thereby obtaining an evaluation result in a more fair and objective manner, reducing an error caused by artificial adoption of data for training, and furthermore preventing a subjective error caused by artificial evaluation.

Description

Technical field [0001] The invention relates to the technical field of image processing, in particular to a method and device for evaluating the flatness of fabrics based on unsupervised machine learning. Background technique [0002] Textiles and garments are affected by many factors in the process of household daily care and industrial washing, and their appearance changes, which reduces the appearance and wearability of clothes. People's requirements for clothing are not only the appearance style, but also its anti-wrinkle ability. Therefore, when the factory produces fabrics, it also needs to conduct related tests on its anti-wrinkle ability. Therefore, the American Association of Textile Chemists and Dyers has formulated relevant standards (such as AATCC 124) to classify different wrinkles. However, the traditional rating is done manually, due to the influence of work intensity, pressure and other factors, the result of the assessment has a certain degree of subjectivity. ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
IPC IPC(8): G06K9/40G06K9/46G06K9/62
CPCG06V10/30G06V10/462G06F18/23213G06F18/2411
Inventor 孙鹏王若梅邓代国
Owner SUN YAT SEN UNIV
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap