Unlock instant, AI-driven research and patent intelligence for your innovation.

A functional graphic method, array substrate and display device

A production method and graphics technology, which are applied in semiconductor/solid-state device manufacturing, semiconductor devices, electrical components, etc., can solve the problems of complex production process and low efficiency of display device functional graphics, so as to improve production efficiency, simplify production process, reduce The effect of production costs

Active Publication Date: 2018-12-18
BOE TECH GRP CO LTD
View PDF4 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] The purpose of the present invention is to solve the problem that the current display device functional graphics production process is complicated and the efficiency is low

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • A functional graphic method, array substrate and display device
  • A functional graphic method, array substrate and display device
  • A functional graphic method, array substrate and display device

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0033] In order to make the technical problems, technical solutions and advantages to be solved by the present invention clearer, the following will describe in detail with reference to the drawings and specific embodiments.

[0034] The present invention provides a solution to the problem of complex and low-efficiency manufacturing process of functional graphics in the existing display panel.

[0035] In one aspect, the present invention provides a method for making a functional graphic, comprising:

[0036] Step 1, refer to Figure 1A , forming a base layer 2 with a groove structure 21 on the base substrate 1, the shape of the groove structure 21 corresponds to the shape of the functional pattern to be formed;

[0037] Step two, refer to Figure 1B , filling the groove structure 21 with a rheological material (black shaded pattern) for forming a functional pattern;

[0038] Step three, refer to Figure 1C , solidify the rheological material of 21 in the groove structure,...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention provides a manufacturing method of a functional pattern, an array substrate and a display device, and relates to the field of display. The manufacturing method comprises the following steps: forming a base layer of a groove structure on a substrate, wherein the shape of the groove structure corresponds to that of a functional pattern to be formed; filling a rheological material for forming the functional pattern in the groove structure; solidifying the rheological material in the groove structure so as to obtain the functional pattern; and removing the base layer. The patterned rheological material can be directly sedimented, and the rheological material can serve as the functional pattern after being solidified; and compared with the prior art, the functional pattern does not need to be etched, so that the manufacturing working procedure is simplified, the manufacturing efficiency is improved, and the manufacturing cost is reduced.

Description

technical field [0001] The invention relates to the display field, in particular to a method for making functional graphics, an array substrate and a display device. Background technique [0002] In the existing display panel structure, various functional patterns (such as electrodes, signal lines, etc.) are formed on the base substrate. These functional graphics manufacturing processes are to first deposit a material layer on the substrate, and then etch the material layer into a required graphic structure. [0003] Taking the functional layer as the electrode as an example, the existing method of making the electrode is to deposit a metal layer and a photoresist layer on the substrate, and then use a mask to expose and develop the photoresist layer, so that the photoresist layer layer to form the pattern of the electrode, and finally use an etchant to etch the metal layer. During the etching process, the photoresist layer remaining from exposure and development can provi...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): H01L21/77H01L27/12
CPCH01L27/1214H01L27/1259H01L27/1292
Inventor 班圣光姚琪薛大鹏路达
Owner BOE TECH GRP CO LTD