Measuring method and adjusting method of lye concentration of developing solution
A technology of concentration measurement and adjustment method, applied in measurement devices, chemical method analysis, photography, etc., can solve the problems of inaccurate measurement results, affect the quality of developed products, etc., and achieve the effect of reducing interference
Active Publication Date: 2019-01-22
TCL CHINA STAR OPTOELECTRONICS TECH CO LTD
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Problems solved by technology
At the same time, the lye continuously absorbs CO2 in the air, causing the concentration of carbonate and bicarbonate in the system to increase continuously. The increased conductive ions above will interfere with the decreasing lye ions, making the concentration of lye measured by the conductivity meter Greater than the actual theoretical value, the measurement result is inaccurate
And the more the number of developing films, the greater the deviation will be, seriously affecting the quality of developing products
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[0031] In order to make the object, technical solution and advantages of the present invention more clear, the present invention will be further described in detail below in conjunction with the accompanying drawings and embodiments. It should be understood that the specific embodiments described here are only used to explain the present invention, not to limit the present invention.
[0032] refer to figure 1 , the developer solution lye concentration measuring method of the embodiment of the present invention comprises:
[0033] S01. Data collection: for the same type of substrate samples, when collecting and developing substrate samples with different number x, the online lye concentration value Y of the developer sample measured by the online conductivity meter measurement system 1 , and the actual lye concentration value Y of the developer sample measured by the off-line potentiometric titrator;
[0034] S02, model building: according to the online lye concentration val...
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The invention discloses a developer alkali liquor concentration measuring method and adjusting method; the measuring method comprises: collecting data, to be specific, collecting an online alkali liquor concentration value and actual alkali liquor concentration value of a developer sample when different numbers of substrates are under developing; establishing a model, to be specific, establishing a correction function model for alkali liquor error and substrate sample number according to an alkali liquor error acquired by subtracting the measured online alkali liquor concentration value by the actual alkali liquor concentration value; importing in the model, to be specific, importing the correction function model into an online measuring system to obtain an actual alkali liquor concentrating value. By establishing the correction function model for alkali liquor concentration in a developer and developing sheet number and using a function relational model to correct an existing online conductivity meter measuring system, the disturbance of development products increased in a developing system with the increased number of developing sheets is maximally reduced, accurate and quick online measurement and monitoring are provided for the alkali liquor concentration in the developer, high-precision management is provided for the composition and concentration of the developer, and the formation of precise developed graphs is technically guaranteed.
Description
technical field [0001] The invention relates to the technical field of manufacturing liquid crystal display panels, in particular to a method for measuring and adjusting the concentration of a developing solution alkali solution. Background technique [0002] The production of TFT-LCD (thin film transistor-liquid crystal display, thin film transistor liquid crystal display) is roughly divided into three major processes: array, box forming, and module, and the array process is roughly divided into film formation, photolithography and Etching three major processes. Exposure and development are the two most critical steps in the photolithography process. Exposure is a photochemical reaction that precisely transfers the pattern on the mask plate to the photoresist. The colloid is removed, leaving the cavity film of the unphotosensitive or photosensitive part, so as to display the required graphics; the development process is to put the exposed glass substrate into the developin...
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IPC IPC(8): G01N31/16G03F7/32
CPCG01N31/164G03F7/322
Inventor 徐蕊
Owner TCL CHINA STAR OPTOELECTRONICS TECH CO LTD