Stainless steel single sealing head production method
A manufacturing method and single-head technology, applied in the field of machinery, can solve the problems of low deposition rate, high substrate temperature, difficult practical use of nano metal films, etc., and achieve the effects of simple equipment, easy parameter control, and scientific design.
Inactive Publication Date: 2017-05-10
QINGDAO XUSHENG HEAD
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Problems solved by technology
People have used chemical vapor deposition (CVD), ion implantation and ion plating to prepare nano-metal thin films of different materials. However, during the use of these processes, the substrate temperature is too high and the deposition rate is low. Practical use of nanometal thin films poses difficulties
Method used
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Experimental program
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Effect test
Embodiment Construction
[0005] A method for making a single stainless steel head, characterized in that: firstly, under low microwave power (≦300W) and high target negative bias voltage (≦1200V), bombard the target surface with plasma flow for 6-8 minutes to remove the target Surface oxides and adsorbents; then remove the target bias voltage at a higher microwave power (1000W), apply a higher substrate negative bias voltage (300V), and direct the plasma flow to the substrate. Bombard for 3 to 5 minutes, finally remove the oxides and adsorbates on the surface, and finally deposit the thin film under the determined working conditions.
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The present invention relates to a stainless steel single sealing head production method, which is characterized in that a target surface is bombarded for 6-8 min with a plasma flow under a low microwave power (less than or equal to 300 w) and a high target negative bias voltage (less than or equal to 1200 V) to remove the oxides and the absorbed materials on the target surface, and then the target negative bias voltage is removed under a high microwave power (1000 W). According to the present invention, the stainless steel single sealing head production method has advantages of scientific design, stable operation, simple equipment, high efficiency, easy parameter control, and the like.
Description
technical field [0001] The invention belongs to the field of machinery, and relates to a method for manufacturing a stainless steel single head. Background technique [0002] Because metal thin films have good optical, acoustic and electrical characteristics, they play an increasingly important role in the mechanical and electronic industries. People have used chemical vapor deposition (CVD), ion implantation and ion plating to prepare nano-metal thin films of different materials. However, during the use of these processes, the substrate temperature is too high and the deposition rate is low. The practical use of nano-metal thin films poses difficulties. Contents of the invention [0003] The purpose of the present invention is exactly the defect that exists in the prior art, invents a kind of manufacturing method of stainless steel single head, it is characterized in that: first under low microwave power (≦300W), high target negative bias voltage (≦1200V), Bombard the t...
Claims
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IPC IPC(8): C23C14/34B82Y40/00
Inventor 季振宽
Owner QINGDAO XUSHENG HEAD
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