Controllable equilibrium flow film resistance-reducing negative-pressure defoaming device

A technology of flow film and resistance reduction, which is applied in the direction of electrical components, circuits, conductor/cable insulation, etc. It can solve the problems of reducing the quality of polyimide film, not easy to remove air bubbles, and high density of gelatinous substances, so as to increase the floating and blasting power, low cost and simple operation

Active Publication Date: 2017-06-13
东营兆源机电科技有限公司
View PDF5 Cites 1 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] During the production and processing of electromagnetic wires, polyimide films need to be uniformly and seamlessly coated with polyperfluoroethylene propylene concentrates. This gelatinous substance has a high density and poor fluidity, so it is not easy to remove the air bubbles in it. The polyperfluoroethylene propylene concentrate with air bubbles will cause uneven vacancy during the next step of production, which will reduce the quality of the polyimide film and greatly increase the defective rate of the product

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Controllable equilibrium flow film resistance-reducing negative-pressure defoaming device
  • Controllable equilibrium flow film resistance-reducing negative-pressure defoaming device

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0018] A controllable and balanced flow film resistance-reducing negative pressure defoaming device of the present invention will be further described in detail in conjunction with the accompanying drawings below:

[0019] Such as figure 1 Shown, the present invention comprises sealing cover 1, raw material trough 2, flow film wall 3, finished product trough 4, umbrella-shaped trough 5, annular leakage wall 6, feed opening 7, discharge opening 8, suction pipe 9 and peep The window 10 is characterized in that the angle between the concentrically designed and installed cylindrical kettle body and the umbrella-shaped tank wall forms a raw material tank 2, and the diameter of the lower edge of the umbrella-shaped tank wall is 2-4mm smaller than the diameter of the kettle body. The gap forms an annular drain wall 6, and the wall of the kettle body below the annular drain wall 6 is a flow film wall 3, which is frosted. The upper side of the raw material tank 2 is provided with a fee...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention provides a controllable equilibrium flow film resistance-reducing negative-pressure defoaming device. The device mainly includes a sealing cover, a raw material tank, a flow film wall, a finished product material tank, an umbrella-shaped material tank, an annular leakage wall, a feeding hole, a discharge hole, an exhaust pipe and a squint window. The device is characterized in that the flow film wall is subjected to dull polishing, the width of the annular leakage wall can be adjusted and controlled, the finished product material tank is designed into a funnel shape, the height of the exhaust pipe is set in the coverage area of the umbrella-shaped material tank, and the squint window is provided with an amplifiable convex lens. Compared with the prior art, the device has the advantages that the flow film wall obtained after dull polishing can separate and cut colloids and increase the exposure area of a film body, the controllable annular leakage wall can adjust and control the thickness of the flow film body and the residence time of the flow film body on the flow film wall, bubble overflowing and blasting are easily achieved, and the convex lens can improve the precision of movement condition observation.

Description

[0001] 1. Technical field [0002] The invention relates to deep processing of insulating materials for electromagnetic wires, in particular to a controllable and balanced flow film resistance-reducing negative pressure defoaming device. [0003] 2. Background technology [0004] During the production and processing of electromagnetic wires, polyimide films need to be uniformly and seamlessly coated with polyperfluoroethylene propylene concentrates. This gelatinous substance has a high density and poor fluidity, so it is not easy to remove the air bubbles in it. The polyperfluoroethylene propylene concentrate with air bubbles will cause uneven vacancy during the next step of production, thereby reducing the quality of the polyimide film and greatly increasing the defective rate of the product. [0005] 3. Contents of the invention [0006] The purpose of the present invention is to address the above technical problems and provide a controllable and balanced flow film resistanc...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): H01B13/16
CPCH01B13/165
Inventor 苟秀防
Owner 东营兆源机电科技有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products