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Substrate Pretreatment Method for Preparation of Nanodiamond Film

A nano-diamond and substrate pretreatment technology, applied in metal material coating process, coating, gaseous chemical plating, etc., can solve the problems of easy agglomeration of nano-sized particles, high density of diamond micropowder, poor dispersion of seed crystal solution, etc. , to achieve the effect of improving nucleation quality, increasing nucleation density, and good hydrophilicity

Inactive Publication Date: 2019-02-22
SHANGHAI UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] However, the density of diamond micropowder is high, and the nano-sized particles are easy to agglomerate, and the direct preparation of the seed crystal solution has poor dispersibility, which affects the nucleation
In order to improve the dispersibility of nano-diamond powder in organic solvents, the research on improving the molecular structure by modifying the surface functional group mostly uses linear polyether compounds, while the research on hyperbranched polyols such as polyglycerol is relatively small. However, the application of polyglycerin to improve the modification of nano-diamond powder has not yet been reported.

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0020] In this embodiment, a substrate pretreatment method for preparing nano-diamond thin films includes the following steps:

[0021] a. Pretreatment of nano diamond powder:

[0022] A mixed solution of concentrated sulfuric acid with a concentration of 98.3% by mass and a concentrated nitric acid with a concentration of 60% by mass is used to prepare a strong acid mixture in a volume ratio of 3:1, and then the particle size is 10nm. Diamond (ND) powder is added to the strong acid mixture and mixed thoroughly, and the mixture of diamond powder and strong acid is heated at 180°C for 3 hours to obtain the powder, and then after the powder is evaporated to dryness, add deionized water, and then filter , Make the obtained powder until it is neutral, then dry the powder in a drying oven to obtain ND pretreatment powder;

[0023] b. Preparation of polymerized glycerol grafted nanodiamond powder (ND-PG):

[0024] Take 60 mg of the ND pretreatment powder prepared in step a and dissolve it ...

Embodiment 2

[0032] This embodiment is basically the same as the first embodiment, and the special features are:

[0033] In this embodiment, a substrate pretreatment method for preparing nano-diamond thin films includes the following steps:

[0034] a. Pretreatment of nano diamond powder:

[0035] A mixed solution of concentrated sulfuric acid with a concentration of 98.3% by mass and concentrated nitric acid with a concentration of 60% by mass is used to prepare a strong acid mixture in a ratio of 1:1 by volume of concentrated sulfuric acid and concentrated nitric acid, and then a nanometer particle size of 1nm Diamond (ND) powder is added to the strong acid mixture and mixed thoroughly, and the mixture of diamond powder and strong acid is heated at 100°C for 5 hours to obtain the powder, and then after the powder is evaporated to dryness, add deionized water and then filter , Make the obtained powder until it is neutral, then dry the powder in a drying oven to obtain ND pretreatment powder;

...

Embodiment 3

[0045] This embodiment is basically the same as the previous embodiment, and the special features are:

[0046] In this embodiment, a substrate pretreatment method for preparing nano-diamond thin films includes the following steps:

[0047] a. Pretreatment of nano diamond powder:

[0048] A mixed solution of concentrated sulfuric acid with a concentration of 98.3% by mass and a concentrated nitric acid with a concentration of 60% by mass is used to prepare a strong acid mixture in a volume ratio of 5:1 between concentrated sulfuric acid and concentrated nitric acid. Diamond (ND) powder is added to the strong acid mixture and mixed thoroughly, and the mixture of diamond powder and strong acid is heated at 300°C for 1 hour to obtain the powder, and then after the powder is evaporated to dryness, add deionized water, and then filter , Make the obtained powder until it is neutral, then dry the powder in a drying oven to obtain ND pretreatment powder;

[0049] b. Preparation of polymerize...

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Abstract

The invention discloses a substrate pretreatment method for preparing a nano-diamond film. A functional group is formed on a nano-diamond powder surface by utilizing open-loop multi-branch polymerization of glycidol, and nano-diamond powder (ND-PG) grafted with the glycidol and with high dispersibility in a solution is obtained, and dissolves in a methanol solution to obtain a seeded solution for film nucleation, so that an effective method is provided for using a high quality nano-diamond film with microwave plasma chemical vapor deposition on a heterogeneous substrate. In the invention, the functional group is grafted with the nano-diamond powder surface, the dispersibility of the powder in water is improved greatly, and agglomeration is reduced; peripheral derivative effect is further functionalized, in favor of increasing the nucleation density of the substrate; the nucleation quality is improved, and the substrate pretreatment method is of great significance for preparation of the high-quality nano-diamond film.

Description

Technical field [0001] The invention relates to an inorganic non-metallic material manufacturing process, in particular to a nano-diamond film preparation process, and also to a substrate pretreatment method, which is applied to the technical field of diamond film preparation. Background technique [0002] Diamond, as a material with many unique properties, such as large forbidden band width (up to 5.5eV), low dielectric constant, high breakdown voltage, high electron hole mobility, high thermal conductivity and superior radiation resistance, and Good chemical stability, all of these physical, chemical and electrical properties make it possible for diamond to become a material for electronic equipment working under harsh conditions such as high temperature and strong radiation in the future. [0003] In recent years, people have paid more attention to the use of CVD to prepare diamond films, and great progress has been made. However, the preparation process of diamond films has ver...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C16/02C23C16/27C23C16/511
CPCC23C16/0272C23C16/274C23C16/511
Inventor 王林军赵申洁黄健任兵唐可
Owner SHANGHAI UNIV
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