Device and method for measuring divergence angle distribution of electron beam

Abstract

The invention discloses a device and method for measuring the divergence angle distribution of an electron beam, and the device comprises a sealed vacuum target room, a conversion target, and an anti-scattering shading column. The sealed vacuum target room is provided with a light output window corresponding to the anti-scattering shading column. The device also comprises an imaging system. After the electron beam bombards the conversion target, Cherenkov radiation light is generated, and the Cherenkov radiation light enters the anti-scattering shading column and then is outputted through the light output window. The Cherenkov radiation light is imaged on the imaging system after being filtered by a narrow band filter. According to the invention, after the electron beam bombards the conversion target, Cherenkov radiation light is generated, and the Cherenkov radiation light enters the anti-scattering shading column and then is outputted through the light output window. The focal plane imaging of the Cherenkov radiation light is carried out on the imaging system after being filtered by the narrow band filter. Through the focal plane imaging, the device deduces the divergence angle distribution of the electron beam by inversion.

Description

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AI Technical Summary

Benefits of technology

The technical effect of this patented inventor's new type of apparatus called Electron Beam Diffraction Lens (EBLD) is described by its unique characteristics: 1) Its measurements are accurate because there is no need to guess how much they should beforehand, 2) By combining multiple different types of X ray sources into a single unit, high sensitivity can be achieved while maintaining good focus performance over wide angles, 3) Using chirp converging lenses instead of traditional reflection targets reduces noise interference from other signals, 4) Unlike existing methods like scanning laser diodes, EBFD allows for precise control of the scattering angle distribution, 5) A specialized instrument is provided at both ends of the device, allowing for simultanous detection of two wavelength components. Overall, these improvements improve the efficiency, ease of operation, and reliability of current techniques such as electron beam diffractive analysis.

Problems solved by technology

This technical problem addressed in this patents relates to measuring the characteristics (such as particle velocity) of electrons emitted during acceleration experiments with traditional techniques like laser scattering and atomic absorption). However, current measurements have drawbacks due to factors related to these technologies themselves and their precision. There may exist various sources of errors affecting the measured values, leading to poor performance evaluation and potential safety hazards. Therefore, new ways must be developed to improve upon existing methods used for accurate analysis of electronic beam properties.

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