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Filters for Gas Cleaning

A gas cleaning and filter technology, applied in membrane filters, gas treatment, dispersed particle filtration, etc., can solve the problems of reduced elasticity, reduced tightness of cleaning ports, low moisture absorption, etc., to achieve improved yield, shortened process, and reduced cost effect

Active Publication Date: 2020-08-28
MIRAIAL CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0015] If the filter case is made of low outgassing, low moisture absorption, and low water absorption resin, the above-mentioned problems can be solved, but in this case, the tightness with the cleaning port will decrease due to the decrease in elasticity. , there is a problem that particles, unwanted gases, and moisture will enter the storage container from the gap between the cleaning port and the filter
Or, there is a problem that cleaning gas leaks from the front end of the cleaning port due to a decrease in tightness between the filter case and the cleaning port, and the efficiency of gas cleaning decreases.
Therefore, in the past, there was a problem that the above-mentioned problems could not be solved at the same time.

Method used

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  • Filters for Gas Cleaning
  • Filters for Gas Cleaning
  • Filters for Gas Cleaning

Examples

Experimental program
Comparison scheme
Effect test

no. 1 Embodiment approach

[0040]Hereinafter, a gas cleaning filter 80 according to a first embodiment of the present invention will be described with reference to the drawings. figure 1 It is an exploded perspective view showing a state in which the gas cleaning filter 80 according to the first embodiment of the present invention is attached to the storage container 1 and the substrate W is stored. figure 2 It is a bottom perspective view showing a state where the gas cleaning filter 80 according to the first embodiment of the present invention is attached to the storage container 1 . Figure 3A It is an upper perspective view showing the gas cleaning filter 80 according to the first embodiment of the present invention. Figure 3B It is a bottom perspective view showing the gas cleaning filter 80 according to the first embodiment of the present invention. Figure 4 It is an exploded perspective view showing the gas cleaning filter 80 according to the first embodiment of the present invention. Figur...

no. 2 Embodiment approach

[0077] Next, refer to Figure 7A with Figure 7B A gas cleaning filter 80A according to a second embodiment of the present invention will be described. Figure 7A It is an enlarged cross-sectional view showing the vicinity of the gas cleaning filter front end portion 406A of the gas cleaning filter 80A according to the second embodiment of the present invention, and shows a state before contact with the cleaning port 800 . Figure 7B It is an enlarged cross-sectional view showing the vicinity of the gas cleaning filter front end portion 406A of the gas cleaning filter 80A according to the second embodiment of the present invention, and is a view showing a state in which it is in contact with the cleaning port 800 .

[0078] The gas cleaning filter of the second embodiment is an example in which the shape of the tip portion of the gas cleaning filter is different from that of the gas cleaning filter of the first embodiment. The configuration other than that is the same as tha...

no. 3 Embodiment approach

[0084] Next, refer to Figure 8A with Figure 8B A gas cleaning filter 80B according to a third embodiment of the present invention will be described. Figure 8A It is an enlarged cross-sectional view showing the vicinity of the gas cleaning filter front end portion 406B of the gas cleaning filter 80B according to the third embodiment of the present invention, and shows a state before contact with the cleaning port 800 . Figure 8B It is an enlarged cross-sectional view showing the vicinity of the gas cleaning filter front end portion 406B of the gas cleaning filter 80B according to the third embodiment of the present invention, and is a view showing a state in which it is in contact with the cleaning port 800 .

[0085] The gas cleaning filter according to the third embodiment is an example in which the shape of the tip portion of the gas cleaning filter and the shape of the tip portion of the cleaning port are different from those of the first embodiment. The other configu...

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Abstract

A filter for gas cleaning, used on a storage container (1) composed of a container body and a cover, which has: a filter housing (100), the filter housing has a storage container (1) that can a ventilation space (110) in which the gas of the external space is ventilated with the gas of the storage space (27); and a gasket (300) formed on the outside of the storage space of the filter housing (100) to form the ventilation space (110) ) is formed so as to cover the outer peripheral surface of a part of the nozzle part (103), and the gasket (300) is formed of an elastic body.

Description

technical field [0001] The present invention relates to a gas cleaning filter used in a container used for storing, storing, transporting, transporting, and the like a substrate composed of a semiconductor wafer or the like. Background technique [0002] Conventionally, a storage container having a container main body and a lid body is known as a storage container for storing a substrate composed of a semiconductor wafer and transporting it in a process in a factory. [0003] The container body has a cylindrical wall portion in which the container body opening is formed at one end and the other end is closed. The lid can be attached to and detached from the opening of the container body, and can close the opening of the container body. By closing the container main body with the lid, a storage space for storing substrates and the like is formed in the storage container. The storage space is surrounded by the wall of the container body and the inner surface of the lid, and ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L21/673F16K15/02
CPCF16K15/026B01D46/4272B01D46/526B01D2279/45B01D46/0005H01L21/67393F16K15/02H01L21/67389B01D46/10B01D2279/35F16K15/028
Inventor 笠间宣行永岛刚
Owner MIRAIAL CO LTD