A kind of diffusion device and deposition chamber
A diffusion device and diffusion plate technology, applied in the field of diffusion devices and deposition chambers, can solve the problems of low uniformity of deposition film thickness, difficult position adjustment, short service life, etc., achieve uniform thickness, improve stability and good The effect of uniform rate and distribution density
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Embodiment 1
[0034] This embodiment provides a diffusion device for diffusing the gas passing through it, such as figure 2 and image 3 As shown, it includes: at least two diffuser plates 1, at least two diffuser plates 1 are spaced from each other and overlapped correspondingly, each diffuser plate 1 is provided with a plurality of through holes 11, and the distance between the diffuser plates 1 The distribution density of the through holes 11 on the diffuser plate 1 can correspond to the distribution density of the gas distributed on the gas inlet side of the diffuser, so that the gas passing through the diffuser can be output uniformly.
[0035] Wherein, the spacing between the diffusion plates 1 and the distribution density of the through holes 11 on the diffusion plate 1 can correspond to the distribution density of the gas distributed on the gas inlet side of the diffusion device means: The distribution density of the gas on the side is adjusted accordingly to the spacing between t...
Embodiment 2
[0044] This embodiment provides a diffusion device, and the difference from Embodiment 1 is that, as Figure 6 As shown, the multiple sub-diffusers 10 of each diffuser 1 are located on the same plane, and the multiple sub-diffusers 10 are seamlessly spliced.
[0045] In this embodiment, the distribution density of the through holes 11 on each sub-diffuser plate 10 spliced to form the entire diffuser plate 1 is the same.
[0046] It should be noted that the distribution density of through holes 11 on any two adjacent diffuser plates 1 may be the same or different, therefore, the distance between any two adjacent diffuser plates 1 may be equal or unequal, so It is also possible to make the distribution density of the gas passing through the diffusion device more uniform through the selection of the distribution density of the through holes 11 on two adjacent diffusion plates 1 and the adjustment of the distance between the two diffusion plates 1, so that the deposition The th...
Embodiment 3
[0049] This embodiment provides a diffusion device, which is different from Embodiment 1-2, such as Figure 7 As shown, the diffusion plates 1 are parallel to each other, and the positions of the through holes 11 in any two adjacent diffusion plates 1 are staggered from each other. Figure 7 The diffusion device shown in exemplifies two diffusion plates 1 .
[0050] Other structures of the diffusion device in this embodiment are the same as those in Embodiment 1 or 2, and will not be repeated here.
[0051] By staggering the positions of the through-holes 11 in any two adjacent diffuser plates 1, the gas passing through the diffuser plate 1 can also be output more uniformly after combing through the through-holes 11 in a plurality of diffuser plates 1, so that the deposition The thickness of the film layer on the substrate is more uniform.
[0052] Beneficial effects of embodiment 1-3: the diffusion device provided in embodiment 1-3, by setting at least two diffusion plates,...
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