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Novel material

a technology of new materials and materials, applied in the field of substrates, can solve the problems of new materials and structures which are otherwise impossible to fabricate, and achieve the effects of increasing refractive index and/or waveguide structures, facilitating ion-implantation, and increasing sensitivity

Inactive Publication Date: 2020-07-30
UNIV OF LEEDS
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Benefits of technology

This patent describes a way to create a layer with ions implanted into it. The ions are implanted in a way that their penetration depth is at least 50 nm, and they are evenly distributed throughout the layer. This means that the ions don't just stay in one part of the layer, but they are evenly distributed throughout. This results in a more uniform and continuous distribution of the ions, rather than a peak and then a drop-off. The process also creates a sharp boundary where the ions become very rare, which helps to define the edge of the layer. This method could be useful for creating optical devices or waveguides where light can be transmitted and measured.

Problems solved by technology

This observation has the potential to produce new materials and structures which are otherwise impossible to fabricate.

Method used

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Examples

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example 1

Implantation Into Silica Glass

[0142]Multi-ion implantation into silica glass 4 was produced via femtosecond laser ablation of an erbium doped tellurite glass target containing zinc and sodium. A Ti-sapphire femtosecond laser 1 operating at a wavelength of 800 nm with 100 fs pulse width and a maximum repetition rate of 1 kHz (Coherent Inc, Santa Clara, Calif., USA) was used to ablate the glass target 2 generating an expanding plasma plume 3 consisting of multiple metal ions (multi-ion). A tellurite glass target with a molar composition of 79.5TeO2 : 10ZnO0:10Na2O: 0:0.5Er2O3 produces multiple ions of Te, Zn, Na and Er, which diffuse into the silica glass substrate 4 under certain process conditions. The silica glass substrate was coupled to a heater chamber arranged to heat the substrate to a desired temperature. The ablation, plasma production and the multi-ion implantation process are schematically shown in FIG. 1A-1C.

[0143]Experiments were carried by varying the laser energy, repe...

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Abstract

The present invention relates to a substrate comprising an ion-implanted layer, for example a cation, wherein the ion implanted layer has a substantially uniform distribution of the implanted ions at a significantly greater depth than previously possible, to a well-defined and sharp boundary within the substrate. The invention further comprises said substrate wherein the substrate is a silicon based substrate, such as glass. The invention also comprises the use of said material as a waveguide and the use of said material in measurement devices.

Description

RELATED APPLICATIONS[0001]This is a continuation-in-part application of U.S. application Ser. No. 14 / 377,403, filed Aug. 7, 2014, which is a 371 application of International Application No. PCT / GB2013 / 050300 filed Feb. 8, 2013, which claims the benefit of priority of United Kingdom Patent Application No. 1202128.3 filed Feb. 8, 2012. Each of the foregoing applications is hereby incorporated herein by reference.FIELD OF THE INVENTION[0002]The present invention relates to a substrate comprising an ion-implanted layer, for example a cation, wherein the ion implanted layer has a uniform distribution of the implanted ions at a significantly greater depth than previously possible. The invention further comprises said substrate wherein the substrate is a silicon based substrate, such as glass. The invention may also comprise the use of said material as a waveguide and / or the use of said material in measurement devices.BACKGROUND[0003]Femtosecond pulsed laser plasma deposition (fs-PLD) is a...

Claims

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Application Information

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Patent Type & Authority Applications(United States)
IPC IPC(8): C03C23/00C03C3/04C23C14/32C23C14/48C23C14/22A61B5/1455C23C14/28G02B6/12
CPCG02B2006/12061G02B2006/12188A61B5/1455C23C14/48C03C23/0055Y10T428/315Y10T428/31C23C14/28C23C14/32C23C14/221C03C3/04
Inventor JOSE, GINFERNANDEZ, TONEY TEDDYGRANT, PETER JOHNJHA, ANIMESHSAHA, SIKHASTEENSON, DAVID PAUL
Owner UNIV OF LEEDS
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