Novel material

a technology of new materials and materials, applied in the field of substrates, can solve the problems of new materials and structures which are otherwise impossible to fabricate, and achieve the effects of increasing refractive index and/or waveguide structures, facilitating ion-implantation, and increasing sensitivity
US20200239362A1Inactive Publication Date: 2020-07-30UNIV OF LEEDS
0 Cites 0 Cited by

Patent Information

Authority / Receiving Office
US · United States
Patent Type
Applications(United States)
Current Assignee / Owner
UNIV OF LEEDS
Publication Date
2020-07-30
Estimated Expiration
Not applicable · inactive patent

Smart Images

  • Figure 1
    Figure 1
  • Figure 2
    Figure 2
  • Figure 3
    Figure 3
Patent Text Reader

Abstract

The present invention relates to a substrate comprising an ion-implanted layer, for example a cation, wherein the ion implanted layer has a substantially uniform distribution of the implanted ions at a significantly greater depth than previously possible, to a well-defined and sharp boundary within the substrate. The invention further comprises said substrate wherein the substrate is a silicon based substrate, such as glass. The invention also comprises the use of said material as a waveguide and the use of said material in measurement devices.
Need to check novelty before this filing date? Find Prior Art

Description

RELATED APPLICATIONS

[0001] This is a continuation-in-part application of U.S. application Ser. No. 14 / 377,403, filed Aug. 7, 2014, which is a 371 application of International Application No. PCT / GB2013 / 050300 filed Feb. 8, 2013, which claims the benefit of priority of United Kingdom Patent Application No. 1202128.3 filed Feb. 8, 2012. Each of the foregoing applications is hereby incorporated herein by reference.FIELD OF THE INVENTION

[0002] The present invention relates to a substrate comprising an ion-implanted layer, for example a cation, wherein the ion implanted layer has a uniform distribution of the implanted ions at a significantly greater depth than previously possible. The invention further comprises said substrate wherein the substrate is a silicon based substrate, such as glass. The invention may also comprise the use of said material as a waveguide and / or the use of said material in measurement devices.BACKGROUND

[0003] Femtosecond pulsed laser plasma deposition (fs-PLD) is a...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More