Color optical filter and manufacturing method thereof
A technology of color filter and manufacturing method, applied in optics, opto-mechanical equipment, nonlinear optics, etc., to achieve the effect of increasing absolute height, improving surface pressure resistance, and reducing process flow and production cost
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Embodiment 1
[0033] Such as Figure 2-5 As shown, a color filter includes a base substrate 1, a black matrix layer 2, a color filter layer 3 arranged between the black matrix layers, and a layer covering the black matrix layer and the color filter layer The flat layer 4 also includes a main spacer 5 and an auxiliary spacer 6;
[0034] The main spacer 5 is arranged on the flat layer 4; the flat layer 4 is provided with an accommodation hole, and the auxiliary spacer 6 is arranged in the accommodation hole, and the depth of the accommodation hole is It is equal to the height difference Δ between the main spacer 5 and the auxiliary spacer 6 above the top surface of the flat layer, so that the actual heights of the main spacer 5 and the auxiliary spacer 6 are the same.
[0035] In the embodiment of the present invention, the accommodating hole runs through the flat layer 4, the bottom surface of the auxiliary spacer 6 is attached to the surface of the black matrix, and the outer wall of the a...
Embodiment 2
[0039] The difference between the present embodiment and the first embodiment is that the accommodating hole is groove-shaped, and the bottom surface and the outer sidewall of the auxiliary spacer 6 are attached to the accommodating hole.
[0040] It and part are all identical with embodiment one.
Embodiment 3
[0042] Such as Figure 2-5 Shown, a kind of manufacturing method of color filter comprises the following steps:
[0043] S1: Form a black matrix layer on the base substrate, see figure 2 ;
[0044] The step S1 specifically includes: coating the photoresist for manufacturing the black matrix layer on the glass substrate, placing the mask plate on the photoresist, and the mask plate is provided with a light hole at a position corresponding to the required formation of the black matrix , the shape of the light hole is adapted to the black matrix, and then the front side is exposed for photoreaction and development to form a black matrix.
[0045] S2: Form a color filter layer on the black matrix layer, see for details image 3 ;
[0046] The step S2 is specifically: coating the photoresist for manufacturing the color filter layer on the black matrix layer, placing the mask on the photoresist, and placing the mask on the sub-sections corresponding to each color block area of ...
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