Film coating system and film coating method

A coating system and film thickness technology, applied in sputtering plating, ion implantation plating, gaseous chemical plating, etc., can solve problems such as film thickness deviation and process instability, and achieve small correction errors, save time, The effect of saving raw material expenses

Inactive Publication Date: 2017-10-24
茆胜
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0004] The technical problem to be solved by the present invention is to provide a film coating system and a film coating method for the defects of film thickness deviation and process instability caused by the change of the correction factor of the film thickness monitoring device in the prior art

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  • Film coating system and film coating method
  • Film coating system and film coating method
  • Film coating system and film coating method

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Embodiment Construction

[0023] In order to make the object, technical solution and advantages of the present invention clearer, the present invention will be further described in detail below in conjunction with the accompanying drawings and embodiments. It should be understood that the specific embodiments described here are only used to explain the present invention, not to limit the present invention.

[0024] see figure 1 , figure 1 A schematic structural view of a coating system according to a first embodiment of the present invention is shown, the coating system includes a substrate 1, a coating source 2 located below the substrate 1, a first film thickness monitoring device 3 and a second film thickness monitoring device 4, the first A film thickness monitoring device 3 is located between the substrate 1 and the coating source 2 , and a second film thickness monitoring device 4 is adjacent to the substrate 1 . During the working process, the coating source 2 produces the gas flow 21 of the c...

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Abstract

The invention relates to a film coating system and a film coating method. The film coating system comprises a base plate, a film coating source located below the base plate, a first film thickness monitoring device and a second film thickness monitoring device; the first film thickness monitoring device is located between the base plate and the film coating source, and the second film thickness monitoring device is close to the base plate. The two film thickness monitoring device can do cooperative work, and therefore the equipment stability and reliability are improved. The second film thickness monitoring device is close to the base plate, the film coating speed and the film thickness value which are obtained by the second film thickness monitoring device are quiet approximate to those of true values of the base plate, in other words, the correction factor approximate to 100%, the beneficial effect of being small in correcting error is achieved, and therefore the second film thickness monitoring device can be used for checking and correcting the first film thickness monitoring device when needed; and although the correcting method cannot completely replace a traditional method for conducting correction by preparing samples for testing the film thickness, the correction frequency with a traditional manner can be greatly decreased, the time of preparing the samples and testing the film thickness is saved, and raw material cost is saved.

Description

technical field [0001] The invention relates to the field of coating, in particular to a coating system and a coating method. Background technique [0002] In vacuum coating equipment, the quartz crystal oscillation monitoring method is the most commonly used method to monitor the film thickness and material evaporation rate during the process. The quartz crystal oscillation monitoring method mainly utilizes the piezoelectric effect and mass load effect of the quartz crystal. When a thin film is deposited on the surface of the crystal oscillator, the vibration of the crystal will weaken. The reduction of this vibration or frequency is caused by the thickness of the film and Density is determined by using very sophisticated electronic equipment to test the change of vibration multiple times per second, so as to realize real-time monitoring of evaporation rate and film thickness. [0003] In OLED (Organic Light-Emitting Diode: Organic Light-Emitting Diode) organic coating equ...

Claims

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Application Information

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IPC IPC(8): C23C14/54C23C16/52
CPCC23C14/546C23C16/52
Inventor 茆胜
Owner 茆胜
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