Optical thin film characterization method based on cloud-model quantum evolutionary algorithm

A quantum evolutionary algorithm, optical thin film technology, applied in computational models, biological models, calculations, etc., can solve the problems of large group size, slow convergence speed, complex calculation process, etc. Combined solution with high accuracy

Inactive Publication Date: 2017-11-24
CHANGCHUN UNIV OF SCI & TECH
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Problems solved by technology

Evolutionary algorithm is a global search algorithm, which is easy to jump out of local extremum, but i...

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  • Optical thin film characterization method based on cloud-model quantum evolutionary algorithm
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  • Optical thin film characterization method based on cloud-model quantum evolutionary algorithm

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Embodiment Construction

[0020] As mentioned above, in view of the deficiencies in the prior art, the inventor of this case has been able to propose the technical solution of the present invention after long-term research and a lot of practice, which is mainly a cloud model quantum evolution algorithm (CQEA), based on grazing The characterization method of single-layer film and multi-layer film fitted by X-ray reflection (GIXR) has the advantages of small population size, fast convergence speed and high fitting solution accuracy in the solution process, and solves the problems in the prior art. In the solution process based on evolutionary algorithm, there are problems such as large population size, slow convergence speed, low solution precision and complex calculation process. The technical solution of the present invention will be further explained as follows.

[0021] Briefly speaking, the optical thin film characterization method based on cloud model quantum evolution algorithm of the present inve...

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Abstract

The invention discloses an optical thin film characterization method based on a cloud-model quantum evolutionary algorithm (CQEA). The method comprises the following steps that firstly, an initial parameter of the CQEA is input; secondly, a microstructure parameter of an optical thin film is subjected to quantum coding, and an initial quantum population is generated; thirdly, based on a fitting evaluation coefficient of grazing incidence x-ray reflection (GIXR) of the thin film, the adaptability for characterizing a quantum individual of an optical thin film structure is evaluated, and the optimal quantum individual is selected; fourthly, whether the optimal quantum individual meets an optimization criterion or not is judged, if the optimal quantum individual meets the optimization criterion, the optimal optical thin film structure parameter is output, the algorithm is stopped, and otherwise, the algorithm continues; fifthly, the quantum population is updated through one-dimensional cloud complementary mutation and cross; sixthly, the quantum population is further updated by using an elitism preservation strategy, and the third step is executed. The method is suitable for the microstructure characterization of single-layer and multi-layer optical thin films based on the GIXR, and has the advantages of being low in calculation complexity, quick in convergence rate, high in solving precision and the like.

Description

technical field [0001] The present invention relates to an optical film characterization method based on cloud model quantum evolution algorithm, in particular to a method for characterization of single-layer film and multi-layer film based on grazing incidence X-ray reflection (GIXR) fitting using cloud model quantum evolution algorithm , which belongs to the field of research and development of optical thin films. Background technique [0002] A single-layer film with a film thickness of nanometers or a multilayer film with a periodic thickness of nanometers is an important class of optical components. It has been widely used in many fields such as laser technology, optical communication technology, optical storage technology, and optoelectronic technology. among. Due to the unique optical, electrical, magnetic, mechanical and gas-sensing properties of the single-layer film with a film thickness of nanometer order, it has good development prospects as a functional materia...

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Application Information

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IPC IPC(8): G06F19/00G06N3/00
CPCG06N3/006G16Z99/00
Inventor 匡尚奇张超
Owner CHANGCHUN UNIV OF SCI & TECH
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