A Method for Preparing Large-area Periodic Structures Induced by Line Spots

Abstract

Provided is a method for preparing a large-area periodic structure through linear light spot induction. The method comprises the steps that a functional film material is sputtered on a glass substrate; then the glass substrate is fixed on a three-coordinate workbench, wherein the three-coordinate workbench is matched with a machining light path system; the output laser wavelength, repetition frequency and pulse width of a femto-second laser, a light through hole is adjusted through a small aperture, the laser power is adjusted through an attenuator, the machining process is controlled through a shutter, and light beams are focused into linear light spots through a focusing cylindrical lens; and the functional film material is irradiated through the well adjusted femto-second laser, the horizontal X-direction movement speed of the three-coordinate workbench is set, the three-coordinate workbench returns to the machining start point after arriving at the set position, moves horizontally in the Y direction and then moves in the direction parallel to the X direction, the operation is conducted repeatedly, the machining path is parallel segments, and accordingly the uniform large-area periodic structure is obtained. According to the method, laser rays are focused into the linear light spots through the focusing cylindrical lens, the ablation damage to the functional film material is reduced, and meanwhile the machining efficiency is improved.

Description

technical field [0001] The invention belongs to the technical field of micro-nano manufacturing, and in particular relates to a method for preparing a large-area periodic structure induced by a line spot. Background technique [0002] Surface micro-nanostructures are widely used, and their efficient and controllable preparation technology has received great attention in the past decade. The fabrication of micro-nano structures on the surface of functional thin films has great application potential in many fields such as photoelectric element luminance, solar cell photoelectric conversion efficiency, biochemical sensing, anti-reflection surfaces, field emission devices, and hydrophilic and hydrophobic surfaces. For example, semiconductor materials, which are the cornerstone of the modern semiconductor industry and microelectronics industry, play an inestimable role in promoting the progress of modern society and the development of high-tech. As an ultra-fast processing metho...

AI Technical Summary

Problems solved by technology

As an ultra-fast processing method, the femtosecond laser can produce a large-area uniform periodic structure on the surface of the thin film material, thereby changing the performance of the thin film. However, when the traditional circular lens is used for processing, the focused spot is small and the energy Gaussian distribution is obvious. The energy is too concentrated, which easily damages the middle part of the film, and the efficiency is low, which is not conducive to large-area processing, thus limiting the application and development of the micro-nano structure on the film surface

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