Nano-level dimension semiconductor photoresist peeling method
A semiconductor and photoresist technology, which is applied in the field of nanoscale photoresist stripping on semiconductors, can solve problems such as unexposed photoresist residues, and achieve high-quality stripping, reduced energy consumption, and reduced time.
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[0038] The embodiment of the present invention solves the technical problem of unexposed photoresist residue in the nanoscale structure by providing a stripping method of nanoscale photoresist on the semiconductor. The general idea is as follows:
[0039] First soak in acetone solution at room temperature and clean with low-power ultrasonic waves, then soak in high-temperature acetone solution and clean with high-power ultrasonic waves, so that all photoresists on semiconductors with nano-sized photoresists can be cleaned with low energy consumption. Clean up.
[0040] In order to make the purpose, technical solutions and advantages of the embodiments of the present invention clearer, the technical solutions in the embodiments of the present invention will be clearly and completely described below in conjunction with the drawings in the embodiments of the present invention. Obviously, the described embodiments It is a part of embodiments of the present invention, but not all e...
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