Method and device for determining light polarization ratio degeneracy degree in photoetching objective lens optical design
A technology for lithography objective lens and optical design, which is applied in microlithography exposure equipment, photolithographic process exposure devices, optics, etc., and can solve problems such as unpredictable polarization ratio degradation.
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[0032] In order to make the objectives, technical solutions and advantages of the present invention clearer, the following further describes the present invention in detail with reference to the accompanying drawings and specific embodiments. It should be understood that the specific embodiments described here are only used to explain the present invention, but not to limit the present invention.
[0033] Reference figure 1 As shown, figure 1 It is a schematic flowchart of a preferred embodiment of the method for determining the degradation degree of a specific polarization ratio of a single beam of the present invention.
[0034] The method for determining the degradation degree of the light polarization ratio of the present invention is applied to the optical design of a lithography objective lens, and is particularly aimed at the method for determining the degradation degree of a specific polarization ratio of a single light beam.
[0035] In this embodiment, the method for determ...
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