Resist Stripper
A technology of resist and stripping solution, which is applied in the processing of photosensitive materials, etc., can solve the problems of weak chelation and weak stripping force of resist, and achieve the effect of excellent bath life
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Embodiment 1
[0079] N-methylethanolamine is used as secondary amine.
[0080] N-methylethanolamine (MMA) 5.0% by mass
[0081] Four kinds of polar solvents were mixed including water.
[0082] 2-pyrrolidone (2P) 15.0% by mass
[0083] Propylene glycol (PG) 30.0% by mass
[0084] N,N-Dimethylformamide (DMF) 29.9% by mass
[0085] Water 20.0% by mass
[0086] Hydrazine is used as reducing agent.
[0087] Hydrazine monohydrate (HN·H 2 O) 0.1% by mass
[0088] The above components were mixed and stirred to prepare a sample resist stripping solution of Example 1.
[0089] In addition, 0.1 mass % of hydrazine monohydrate corresponds to 0.064 mass % of hydrazine. The remaining 0.036% by mass of hydrazine monohydrate was water. Therefore, the composition ratio of the above-mentioned water can be said to be 20.036% by mass when the amount charged in the form of hydrazine monohydrate is also included. In all of the following examples and comparative examples, the same meaning applies when ...
Embodiment 2
[0091] N-methylethanolamine is used as secondary amine.
[0092] N-methylethanolamine (MMA) 5.0% by mass
[0093] The polar solvent mixed 4 kinds including water.
[0094] 1-methyl-2-pyrrolidone (NMP) 15.0% by mass
[0095] Propylene glycol (PG) 30.0% by mass
[0096] N,N-Dimethylformamide (DMF) 29.9% by mass
[0097] Water 20.0% by mass
[0098] Hydrazine is used as reducing agent.
[0099] Hydrazine monohydrate (HN·H 2 O) 0.1% by mass
[0100] The above components were mixed and stirred to prepare a sample resist stripping solution of Example 2.
[0101] Example 2 is a composition in which 2-pyrrolidone (2P) in Example 1 is changed to 1-methyl-2-pyrrolidone (NMP). In addition, 0.1 mass % of hydrazine monohydrate corresponds to 0.064 mass % of hydrazine. The remaining 0.036% by mass of hydrazine monohydrate was water. Therefore, the composition ratio of the above-mentioned water can be said to be 20.036% by mass when the amount charged in the form of hydrazine monohyd...
Embodiment 3
[0103] N-ethylethanolamine is used as secondary amine.
[0104] N-ethylethanolamine (EEA) 5.0% by mass
[0105] Four kinds of polar solvents were mixed including water.
[0106] 2-pyrrolidone (2P) 15.0% by mass
[0107] Propylene glycol (PG) 30.0% by mass
[0108] N,N-Dimethylformamide (DMF) 29.9% by mass
[0109] Water 20.0% by mass
[0110] Hydrazine is used as reducing agent.
[0111] Hydrazine monohydrate (HN·H 2 O) 0.1% by mass
[0112] The above components were mixed and stirred to prepare a sample resist stripping solution of Example 3.
[0113] Example 3 is a composition in which N-methylethanolamine (MMA), which is the secondary amine of Example 1, is changed to N-ethylethanolamine (EEA). In addition, 0.1 mass % of hydrazine monohydrate corresponds to 0.064 mass % of hydrazine. The remaining 0.036% by mass of hydrazine monohydrate was water. Therefore, the composition ratio of the above-mentioned water can be said to be 20.036% by mass when the amount charge...
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