Supercharge Your Innovation With Domain-Expert AI Agents!

High-drawability low-peak ultrathin copper foil shiny surface microetching treatment process and equipment

A technology of ultra-thin copper foil and micro-etching treatment, which is applied in the electrolysis process and electrolytic components, etc., can solve the problems of large surface roughness of copper foil, easy oxidation of copper foil surface, unsuitable for ultra-thin copper foil, etc., and achieves lightweight High, strong corrosion resistance, the effect of improving surface strength

Inactive Publication Date: 2018-08-10
江西宏业铜箔有限公司
View PDF5 Cites 2 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

With the development of miniaturization of electronic products, the thickness of copper foil is getting thinner and thinner, and the etching of printed circuit boards is getting thinner. The surface of the foil is easily oxidized, which affects the subsequent pressing and peeling. It is necessary to carry out proper surface treatment on the ultra-thin copper foil. It is no longer suitable for ultra-thin copper foil surface treatment, and a better treatment process must be developed

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • High-drawability low-peak ultrathin copper foil shiny surface microetching treatment process and equipment

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0013] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some, not all, embodiments of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the protection scope of the present invention.

[0014] In the embodiment of the present invention, a smooth surface micro-etching treatment process of high extension and low peak value ultra-thin copper foil includes three steps of micro-etching, water washing and drying. The micro-etching is to immerse the carrier ultra-thin copper foil 6 Surface electrodeposition micro-etching is carried out in the etching tank 8. In the micro-etching tank 8, the temperature is 50° C., and the current density is a composit...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses a high-drawability low-peak ultrathin copper foil shiny surface microetching treatment process and equipment. The process comprises the three steps of microetching, water washing and drying, wherein in the microetching step, carrier ultrathin copper foil is immersed into a microetching tank for surface electro-deposition microetching; side supports are arranged on the leftside of the microetching tank and the right side of a drying tank; a cross rod is stretched over between the two side supports; a transverse driving mechanism is mounted on the cross rod; a telescopicdevice is mounted on the lower side of the transverse driving mechanism; an electric fixture capable of clamping the carrier ultrathin copper foil is mounted at the lower end of the telescopic device. Through the high-drawability low-peak ultrathin copper foil shiny surface microetching treatment process and equipment, the microetching effect is improved, the stability of the ultrathin copper foil is enhanced, and the production process is friendlier to environment.

Description

technical field [0001] The invention relates to the technical field of ultra-thin copper foil surface treatment, in particular to a smooth surface micro-etching treatment process and equipment for high-elongation and low-peak ultra-thin copper foil. Background technique [0002] Ultra-thin copper foil refers to copper foil for printed circuit boards with a thickness of 9 μm or less (also known as ultra-thin copper foil). Due to the difficulty in handling ultra-thin copper foil, it is generally compounded with a carrier as a support. The types of carriers include metal foil (copper foil, aluminum foil), organic film, and the like. Since most of its current product forms are thin copper foil with a carrier, it is called copper foil with a carrier (carrier copper foil) in some documents. Ultra-thin copper foil for PCB is generally produced by electrolysis or calendering, and the majority of copper foils are produced by electrolysis. Both ultra-thin electrolytic copper foil a...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): C25F3/02C25F7/00
CPCC25F3/02C25F7/00
Inventor 潘勤峰
Owner 江西宏业铜箔有限公司
Features
  • R&D
  • Intellectual Property
  • Life Sciences
  • Materials
  • Tech Scout
Why Patsnap Eureka
  • Unparalleled Data Quality
  • Higher Quality Content
  • 60% Fewer Hallucinations
Social media
Patsnap Eureka Blog
Learn More