Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Device suitable for reducing local water passing resistance of rainwater inspection well

A local resistance and inspection well technology, which is applied to water supply devices, waterway systems, drainage structures, etc., can solve the problems of lack of economic cost, low rainwater inspection wells and reduce local resistance, so as to reduce resistance, facilitate exhaust, and reduce local resistance. Effect

Inactive Publication Date: 2018-09-11
SICHUAN UNIV
View PDF5 Cites 1 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] In the current technology, there is a lack of a device for reducing local resistance in rainwater inspection wells that is easy to install and low in economic cost

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Device suitable for reducing local water passing resistance of rainwater inspection well
  • Device suitable for reducing local water passing resistance of rainwater inspection well
  • Device suitable for reducing local water passing resistance of rainwater inspection well

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0032] like figure 1 The schematic diagram of a device suitable for reducing the local resistance of the inspection well in the inspection well is shown, including the rainwater flow channel device 1, which is used to prevent the rainwater from entering the inspection well 2 when the incoming water from the upper section of the rainwater pipe 3 enters the inspection well 2. The flow channel is restricted so that when the rainwater passes through the inspection well, it can keep the original flow channel state as much as possible and enter the downstream rainwater pipe 4, thereby reducing the local resistance when the rainwater passes through the inspection well. After the rainwater outlet 5 connected to the inspection well collects the rainwater, it enters the inspection well through the rainwater transfer pipeline 6, and then merges with the incoming water from the upstream rainwater pipe to enter the next section of the rainwater pipe. like image 3 As shown, the incoming w...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses a device suitable for reducing local water passing resistance of a rainwater inspection well. The device comprises a rainwater whole beam flow channel device composed of a mainbody structure, water inlet holes and exhaust holes. The device focuses on reducing the influence of the local resistance caused by the divergence and re-aggregation of the flow state of passing water when inflow water passes through the inspection well on the drainage capacity of a rainwater system and reducing the resistance influence caused by the impact of the lateral inflow water to water flow of branch pipes to improve the drainage capacity of the rainwater system. By means of the device, the rainwater whole beam flow channel device is installed to restrain a water flow channel of the passing water to reduce the local resistance loss during water passing. When the water flow passes through the device, air is exhausted through the exhaust holes, and therefore the function of releasing gas carried by the inflow water in a drainage pipeline is achieved. The demand of transverse inflow is met through the formation of the water inlet holes, large debris in the rainwater can also be intercepted and collected, and the device is clean and environmentally friendly. The device is simple and effective in structure, easy to install, low in cost and high in flexibility and has good prospects for reducing the local resistance loss when the water passes through the inspection well and improving the drainage capacity of the rainwater system in coping with waterlogging.

Description

technical field [0001] The utility model relates to a device suitable for reducing the local resistance of rainwater inspection wells passing through water. Background technique [0002] In recent years, with the rapid advancement of my country's urbanization process, urban topography has changed greatly, and the frequency of extreme rainstorms has also increased, and urban waterlogging disasters often occur. When a relatively serious waterlogging disaster occurs, it will seriously affect driving safety and threaten the life safety of residents, often causing large economic losses and safety accidents. The main reason is that my country's traditional drainage system design standards are low. [0003] The connection between rainwater pipe network channels is complex and diverse, and the length and size of each pipe section are different. Straight-through inspection wells are one of the most important components of the urban rainwater system. Due to the complexity of the top...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): E03F5/02E03F7/00
Inventor 王庆国刘朝榕胡思骙
Owner SICHUAN UNIV
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com