A dimension measurement system and measurement method based on lab VIEW development platform

A development platform and measurement system technology, applied in the direction of measurement devices, general control systems, control/regulation systems, etc., can solve problems such as cumbersome configuration, poor versatility, and limited accuracy

Active Publication Date: 2020-07-07
SHANGHAI SECOND POLYTECHNIC UNIVERSITY
View PDF6 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] Traditional dimension measurement systems use industrial cameras to capture plane images, and calculate the height of the measured target on the measured object by analyzing grayscale or color images. Such systems usually have strict requirements on the working environment, poor noise immunity, and small field of view , cumbersome configuration, limited accuracy, and insensitivity to the surface of some measured objects lead to poor versatility of the system

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • A dimension measurement system and measurement method based on lab VIEW development platform
  • A dimension measurement system and measurement method based on lab VIEW development platform

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0046] In order to make the technical means, creative features, goals and effects achieved by the present invention easy to understand, the present invention will be further described below in conjunction with specific illustrations.

[0047] see figure 1 and figure 2 As shown, the present invention discloses a dimension measurement system based on the Lab VIEW development platform. The dimension measurement system includes a host computer 10, a PLC 20, a 3D laser camera 30 and a linear module device.

[0048] The upper computer 10 is used to send work instructions to the PLC 20, and complete the signal interaction with the 3D laser camera 30 and the linear module device through the PLC 20; and the movement of the linear module device; the 3D laser camera 30 is installed on the linear module device, the 3D laser camera 30 and the host computer 10 complete data transmission through the TCP / IP protocol, and the 3D laser camera 30 is used to scan the measured object to generate...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention provides a dimension measurement system based on a Lab View development platform, and a measurement method thereof. The dimension measurement system based on a Lab View development platform includes a upper computer, a PLC, a 3D laser camera and a linear module device, wherein the upper computer is used to send an operation instruction to the PLC, and complete signal interaction withthe 3D laser camera and the linear module device through the PLC; the PLC is connected with the upper computer, and receives the instruction of the upper computer to control triggering of the 3D laser camera and movement of the linear module device; the 3D laser camera is arranged on the linear module device; the 3D laser camera is used to scan the measured object to generate 3D point cloud dataand gray scale data, and transmit the data to the upper computer; and the linear module device is connected to the PLC, and is controlled by the PLC to drive the 3D laser camera to move. The dimensionmeasurement system based on a Lab View development platform has the advantages of simple structure, high noise resistance, wide visual field, convenient installation, high accuracy, and high universality, and solves the problems of poor stability, limited visual field, complicated configuration, poor noise resistance and difficult integration caused by a traditional measurement system.

Description

technical field [0001] The invention relates to a size measurement system, in particular to a size measurement system based on a Lab VIEW development platform and a measurement method thereof. Background technique [0002] Today's production industry has extremely strict requirements on size. For the measured objects such as injection-molded shells and welded circuit boards, the height of the measured objects such as column heads, pin headers, and electronic components is the basis for judging whether the product meets the production requirements. an important indicator. [0003] Traditional dimension measurement systems use industrial cameras to capture plane images, and calculate the height of the measured target on the measured object by analyzing grayscale or color images. Such systems usually have strict requirements on the working environment, poor noise immunity, and small field of view , The configuration is cumbersome, the accuracy is limited, and the insensitivity...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Patents(China)
IPC IPC(8): G01B11/02G01B11/00G05B19/05
CPCG01B11/00G01B11/02G05B19/054Y02P90/02
Inventor 秦琴谢鹏沈知玮屠子美朱冬冬陈振宇严学井
Owner SHANGHAI SECOND POLYTECHNIC UNIVERSITY
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products