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Double exponential fitting system and method for lightning impulse voltage waveform by using genetic algorithm

A lightning impulse voltage, double exponential fitting technology, applied in the direction of genetic law, genetic model, etc., can solve problems such as the definition of the double exponential model fitting algorithm, and achieve the effect of good computing power and fast calculation method

Inactive Publication Date: 2018-09-21
SHANGHAI MUNICIPAL ELECTRIC POWER CO +2
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Problems solved by technology

[0008] However, the latest 2010 version of the standard IEC60060-1 does not define the double exponential model fitting algorithm or give a specific reference method

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  • Double exponential fitting system and method for lightning impulse voltage waveform by using genetic algorithm
  • Double exponential fitting system and method for lightning impulse voltage waveform by using genetic algorithm
  • Double exponential fitting system and method for lightning impulse voltage waveform by using genetic algorithm

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Embodiment Construction

[0047] The technical solutions in the embodiments of the present invention will be clearly and completely described below, obviously, the described embodiments are part of the embodiments of the present invention, rather than all the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts shall fall within the protection scope of the present invention.

[0048] The present invention tries to start from the practical application and solve the shortcomings of the existing two-step least squares fitting method to solve the double exponential function model, and proposes a lightning impulse voltage double exponential waveform fitting method optimized by genetic algorithm. That is, for the superimposed overshoot or oscillation lightning impulse waveform recording curve U e (t), according to 0.2 and 0.4 times the limit value processing into a fitting curve, using the geneti...

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Abstract

The present invention relates to a double exponential fitting system and method for the lightning impulse voltage waveform by using a genetic algorithm. The system comprises a first module for data processing and storage of a recording curve of the lightning impulse waveform, a second module for data processing and storage of the fit waveform, a third module for the double exponential function, afourth module for setting genetic algorithm parameters, and a fifth module for iterative processing and displaying. Compared with the prior art, the technical scheme of the present invention has the advantages of simpleness, stability, practicality and rapidness.

Description

technical field [0001] The invention relates to the field of lightning impulse voltage waveforms, in particular to a lightning impulse voltage waveform double-exponential fitting system and method optimized by a genetic algorithm. Background technique [0002] The full wave of lightning impulse voltage can be roughly divided into 5 types: smooth lightning wave, lightning wave with oscillation at the wave front, lightning wave with overshoot at the wave top, lightning wave with oscillation at the top of the wave front and oscillation at the wave top There are overshooting lightning waves. According to the latest 2010 version of IEC60060-1 "High Voltage Test Technology, Part 1: General Definitions and Test Requirements", such as Figure 1a and 1b As shown, for the superimposed overshoot or oscillation lightning impulse waveform recording curve U e (t), it is necessary to obtain its reference curve U m (t) and the residual curve R(t), and use the defined K factor filter to d...

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Application Information

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IPC IPC(8): G06N3/12
CPCG06N3/126
Inventor 司文荣傅晨钊陈璐陆启宇赵丹丹吴天逸袁鹏
Owner SHANGHAI MUNICIPAL ELECTRIC POWER CO
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