High-yield cultivation method of mangifera indica
A cultivation method and mango technology are applied in the field of mango high-yield cultivation, can solve the problems of low yield, unfavorable environmental protection, endanger user health, etc., and achieve the effects of increasing yield per mu and being convenient to eat.
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Examples
Embodiment 1
[0036] A high-yield cultivation method for mango, the main steps comprising:
[0037] (1) Selection of orchard
[0038] It is advisable to choose winter and spring drought, less rainy weather, low air humidity in winter and spring, annual sunshine hours of more than 2000 hours, and sunshine rate of more than 50%. Orchards should be established in areas with irrigation conditions. At the same time, windbreak belts should be established. Areas with low temperature and rain for more than 3 days are not suitable for mango cultivation;
[0039] (2) Hole digging and basal fertilizer
[0040] Dig holes with a surface width of 80 cm, a depth of 70 cm, and a bottom width of 60 cm. Apply base fertilizer one month before planting, apply 20 kg of decomposed farmyard manure to each hole, and 1 kg of calcium, magnesium, and phosphate fertilizers. It is better to combine with pressing greens;
[0041] (3) Planting density
[0042] The row spacing between plants is generally 5 cm x 4 cm, o...
PUM

Abstract
Description
Claims
Application Information

- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com