Clean room affected area detection method

Abstract

The invention discloses a clean room affected area detection method. The method comprises the following steps: (1) providing a clean room, wherein the clean room comprises an air supply space, a ceiling, a cleaning space, a raised floor and an air return space orderly arranged from top to bottom, the ceiling is divided into a plurality of air supply areas, the raised floor is divided into a plurality of air exhaust areas, the air supply areas and the air exhaust areas are arranged up and down in one-to-one correspondence and a cylindrical space is formed between the corresponding air supply area and air exhaust area, the clean room further comprises detection mechanisms in one-to-one correspondence with the cylindrical spaces, and the detection mechanism comprises a corrosion test piece and a detection unit; (2) monitoring an electrical performance parameter of the corrosion test piece of each detection mechanism, and if the electrical performance parameter of the corrosion test pieceof a certain detection mechanism varies continuously according to one trend, judging that the cylindrical space corresponding to the detection mechanism is the affected area. The clean room affected area detection method provided by the invention can realize comprehensiveness and accuracy of corrosive gas detection and can save cost.

Description

technical field [0001] The invention relates to the field of clean production, in particular to a detection method for a clean room damaged area. Background technique [0002] Clean room refers to a well-sealed space that controls air cleanliness, temperature, humidity, pressure, noise and other parameters as required. The development of clean rooms is closely related to modern industry and cutting-edge technology. Due to the environmental requirements of the precision machinery industry (such as gyroscopes, miniature bearings, etc.), the semiconductor industry (such as large-scale integrated circuit production), the development of clean room technology has been promoted. According to domestic statistics, the pass rate of MOS circuit dies produced in an environment without cleanliness requirements is only 10% to 15%, and 64% for memory is only 2%. At present, it is quite common to apply clean rooms in industries such as precision machinery, semiconductors, aerospace, and at...

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Problems solved by technology

[0004] However, the above method has the following defects: firstly, limited by the length of the pipeline, it is impossible to achieve full coverage of the sampling points for a large-area clean room, and it is impossible to achieve comprehensive monitoring; secondly, because each analysis device is connected to multiple different At the sampling point, there will be residual gas flow from the previous analysis in the analysis equipment, which cannot guarantee the purity of the analysis gas in the subsequent analysis, and the monitoring is inaccurate; again, since the pipelines that can be connected to each analysis equipment are limited, the connected sampling points It is also limited, and needs to be equipped with multiple analytical equipment, which are expensive and costly

To sum up, it is difficult to achieve comprehensiveness and accuracy of monitoring with the method of point monitoring, and the cost is high

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