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Multi-channel focused vortex beam generator of all-dielectric material and preparation method

A technology of dielectric materials and vortex beams, applied in optics, instruments, optical components, etc., can solve problems such as difficult integration, complex optical system, and large volume

Pending Publication Date: 2018-12-28
SHANGHAI INST OF TECHNICAL PHYSICS - CHINESE ACAD OF SCI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] The present invention mainly aims at the shortcomings of traditional vortex light generating devices, such as large volume, complex optical path system, and difficulty in integrating into photonic circuits, and proposes a multi-channel focusing vortex beam generator based on all-dielectric materials and its preparation method

Method used

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  • Multi-channel focused vortex beam generator of all-dielectric material and preparation method
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  • Multi-channel focused vortex beam generator of all-dielectric material and preparation method

Examples

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Effect test

Embodiment 1

[0034] See figure 1 , a generator of multi-channel focused vortex beams based on all-dielectric materials, including a substrate 2 and a dielectric nanopillar array 1 .

[0035] ZnS nanopillar arrays grown on SiO 2 On the substrate; the height of the nanocolumn is 550nm, the length is 290nm, the width is 70nm, and the period of the nanocolumn is 320nm; in order to achieve the focus of the vortex beam and realize the multiplexing function, according to the principle of holography and the principle of equal optical path, the medium The phase difference Φ that the nanopillar array must compensate for m (x,y,0) satisfies:

[0036]

[0037]

[0038]

[0039] Where (x, y) is the central coordinate of the dielectric nanopillar on the substrate, θ is its corresponding azimuth angle, j is the imaginary unit, i represents the i-th channel, n represents the number of channels, li represents the i-th channel The topological charge number of a vortex beam. (xi,yi,fi) represen...

Embodiment 2

[0048] See figure 1 , a generator of multi-channel focused vortex beams based on all-dielectric materials, including a substrate 2 and a dielectric nanopillar array 1 .

[0049] Si nanopillar arrays grown on SiO 2 On the substrate; the height of the Si nanocolumn is 800nm, the length is 400nm, the width is 120nm, and the period of the nanocolumn is 500nm; in order to achieve the focus of the vortex beam and realize the multiplexing function, according to the principle of holography and the principle of equal optical path, the The phase difference Φ that the dielectric nanopillar array must compensate m (x,y,0) satisfies:

[0050]

[0051]

[0052]

[0053] Where (x, y) is the center coordinate of the dielectric nanopillar on the substrate, and θ is its corresponding azimuth angle. j is the imaginary unit, i represents the i-th channel, n represents the number of channels, and li represents the topological charge number of the vortex beam of the i-th channel. (xi,...

Embodiment 3

[0062] See figure 1 , a generator of multi-channel focused vortex beams based on all-dielectric materials, including a substrate 2 and a dielectric nanopillar array 1 .

[0063] The Si nanopillar array is grown on the MgF2 substrate; the height of the Si nanopillar is 1500nm, the length is 400nm, the width is 100nm, and the period of the nanopillar is 800nm; in order to achieve the focus of the vortex beam and realize the multiplexing function, according to the principle of holography and equal optical path principle, the dielectric nanopillar array must compensate for the phase difference Φ m (x,y,0) satisfies:

[0064]

[0065]

[0066]

[0067] Where (x, y) is the center coordinate of the dielectric nanopillar on the substrate, and θ is its corresponding azimuth angle. j is the imaginary unit, i represents the i-th channel, n represents the number of channels, and li represents the topological charge number of the vortex beam of the i-th channel. (xi,yi,fi) rep...

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Abstract

The invention discloses a multi-channel focused vortex beam generator of all-dielectric materials and a preparation method. The generator comprises a substrate and a dielectric nanopillar array. The dielectric nanopillars are arranged on the substrate in a specific manner. The multi-channel focused vortex beam generator of the all-dielectric materials adjusts a rotation angle of the nanopillar around a spindle by selecting appropriate nanopillar period and the size (length, width and height) of the nanopillar and introducing a geometric phase so as to achieve the full phase control of the wave-front phase of a transmitted beam; integrates functions of a lens and a vortex phase plate onto a dielectric nanopillar array device so as to achieve the focusing of a vortex beam and generate doughnut type energy density distribution on a set focal plane; and achieves multi-channel generation of the vortex beam on one device based on the holographic principle. The preparation method of the multi-channel focused vortex beam generator of the all-dielectric materials greatly improves the efficiency of a vortex beam generator, reduces the size of the generator, and improves the integrality of the generator.

Description

technical field [0001] The invention relates to beam shaping and spatial light field control technology, in particular to a high-efficiency and high-numerical-aperture multi-channel focusing vortex beam generator of all-dielectric materials and a preparation method thereof. Background technique [0002] With the development of modern communication technology, the explosive growth of information capacity puts forward higher requirements for channel transmission capacity. Due to its unique physical properties, vortex beams have promising application prospects in improving channel transmission capacity. Therefore, in the past few years, the research based on the orbital angular momentum of vortex beams has become an important field in the field of photonics or radio frequency communication. much attention. [0003] Angular momentum is an intrinsic physical property of electromagnetic waves, which consists of spin angular momentum (SAM) and orbital angular momentum (OAM). The ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G02B27/09
CPCG02B27/0938G02B27/0955
Inventor 李冠海欧凯郁菲茏赵增月陈金陈效双陆卫
Owner SHANGHAI INST OF TECHNICAL PHYSICS - CHINESE ACAD OF SCI
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